Fine tuning of lithographic masks through thin films of PS-b -PMMA with different molar mass by rapid thermal processing

ACS Applied Materials and Interfaces

Volumn 6, Issue 10, 2014, Pages 7180-7188

  Ferrarese Lupi, Federico ^a   Giammaria, Tommaso Jacopo ^a,c   Seguini, Gabriele ^a   Vita, Francesco ^b   Francescangeli, Oriano ^b   Sparnacci, Katia ^c   Antonioli, Diego ^c   Gianotti, Valentina ^c   Laus, Michele ^c   Perego, Michele ^a  

^a LABORATORIO MDM   (Italy)

^b UNIVERSITÀ POLITECNICA DELLE MARCHE   (Italy)

^c UNIVERSITY OF EASTERN PIEDMONT   (Italy)

Author keywords

block copolymer; GISAXS analysis; molecular mass; nanopatterning; rapid thermal processing; self assembly

Indexed keywords

ASSEMBLY; ESTERS; MOLECULAR MASS; POLYMETHYL METHACRYLATES; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; THIN FILMS;

ANNEALING TEMPERATURES; GI-SAXS; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; INDUSTRIAL MANUFACTURING; NANOPATTERNING; NANOPOROUS THIN FILMS; POLYSTYRENE-B-POLY(METHYL METHACRYLATE); STRINGENT CONSTRAINTS;

BLOCK COPOLYMERS;

EID: 84901659729     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am5003074     Document Type: Article

References (54)

1. Olson, D.; Chen, L.; Hillmyer, M. Templating Nanoporous Polymers with Ordered Block Copolymers Chem. Mater. 2008, 20, 869-890
2. Yang, S. Y.; Ryu, I.; Kim, H. Y.; Kim, J. K.; Jang, S. K.; Russell, T. P. Nanoporous Membranes with Ultrahigh Selectivity and Flux for the Filtration of Viruses Adv. Mater. 2006, 18, 709-712
3. Phillip, W. A.; O'Neill, B.; Rodwogin, M.; Hillmyer, M. A.; Cussler, E. L. Self-Assembled Block Copolymer Thin Films as Water Filtration Membranes ACS Appl. Mater. Interfaces 2010, 2, 847-853
4. Segalman, R. A.; McCulloch, B.; Kirmayer, S.; Urban, J. J. Block Copolymers for Organic Optoelectronics Macromolecules 2009, 42, 9205-9216
5. Joo, W.; Park, M. S.; Kim, J. K. Block Copolymer Film with Sponge-like Nanoporous Structure for Antireflection Coating Langmuir 2006, 22, 7960-7963
6. Walheim, S.; Shaffer, E.; Mlynek, J.; Steiner, U. Nanophase-Separated Polymer Films as High-Performance Antireflection Coatings Science 1999, 283, 520-522
7. Ruiz, R.; Kang, H.; Detcheverry, F. A.; Dobisz, E.; Kercher, D. S.; Albrecht, T. R.; de Pablo, J. J.; Nealey, P. F. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Science 2008, 321, 936-939
8. Koo, K.; Ahn, H.; Kim, S.-W.; Ryu, D. Y.; Russell, T. P. Directed Self-Assembly of Block Copolymers in the Extreme: Guiding Microdomains from the Small to the Large Soft Matter 2013, 9, 9059
9. 11 Holes in 1 Square Centimeter Science 1997, 276, 1401-1404
10. Herr, D. J. C. Directed Block Copolymer Self-Assembly for Nanoelectronics Fabrication J. Mater. Res. 2011, 26, 122-139
11. Sanders, D. P. Advances in Patterning Materials for 193 Nm Immersion Lithography Chem. Rev. 2010, 110, 321-360
12. Bang, J.; Jeong, U.; Ryu, D. Y.; Russell, T. P.; Hawker, C. J. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns Adv. Mater. 2009, 21, 4769-4792
13. Du, P.; Li, M.; Douki, K.; Li, X.; Garcia, C. B. W.; Jain, a.; Smilgies, D.-M.; Fetters, L. J.; Gruner, S. M.; Wiesner, U.; Ober, C. K. Additive-Driven Phase-Selective Chemistry in Block Copolymer Thin Films: The Convergence of Top-Down and Bottom-Up Approaches Adv. Mater. 2004, 16, 953-957
14. Kim, H.-C.; Park, S.-M.; Hinsberg, W. D. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics Chem. Rev. 2010, 110, 146-177
15. Lo, T.-Y.; Chao, C.-C.; Ho, R.-M.; Georgopanos, P.; Avgeropoulos, A.; Thomas, E. L. Phase Transitions of Polystyrene-b-Poly(dimethylsiloxane) in Solvents of Varying Selectivity Macromolecules 2013, 46, 7513-7524
16. Black, C. T.; Ruiz, R.; Breyta, G.; Cheng, J. Y.; Colburn, M. E.; Guarini, K. W.; Zhang, Y.; Heights, Y. Polymer Self Assembly in Semiconductor Microelectronics IBM J. Res. Dev. 2007, 51, 605-633
17. Fasolka, M. J.; Banerjee, P.; Mayes, A. M.; Pickett, G.; Balazs, A. C. Morphology of Ultrathin Supported Diblock Copolymer Films: Theory and Experiment Macromolecules 2000, 33, 5702-5712
18. Metwalli, E.; Moulin, J.-F.; Rauscher, M.; Kaune, G.; Ruderer, M. A.; Van Bürck, U.; Haese-Seiller, M.; Kampmann, R.; Müller-Buschbaum, P. Structural Investigation of Thin Diblock Copolymer Films Using Time-of-Flight Grazing-Incidence Small-Angle Neutron Scattering J. Appl. Crystallogr. 2010, 44, 84-92
19. Jeong, U.; Ryu, D. Y.; Kho, D. H.; Kim, J. K.; Goldbach, J. T.; Kim, D. H.; Russell, T. P. Enhancement in the Orientation of the Microdomain in Block Copolymer Thin Films upon the Addition of Homopolymer Adv. Mater. 2004, 16, 533-536
20. Ham, S.; Shin, C.; Kim, E.; Ryu, D. Y.; Jeong, U.; Russell, T. P.; Hawker, C. J. Microdomain Orientation of PS-b-PMMA by Controlled Interfacial Interactions Macromolecules 2008, 41, 6431-6437
21. Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. Controlling Polymer-Surface Interactions with Random Copolymer Brushes Science 1997, 275, 1458-1460
22. Ryu, D. Y.; Ham, S.; Kim, E.; Jeong, U.; Hawker, C. J.; Russell, T. P. Cylindrical Microdomain Orientation of PS-b-PMMA on the Balanced Interfacial Interactions: Composition Effect of Block Copolymers Macromolecules 2009, 42, 4902-4906
23. Han, E.; Stuen, K. O.; La, Y.-H.; Nealey, P. F.; Gopalan, P. Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains Macromolecules 2008, 41, 9090-9097
24. Xu, T.; Kim, H.; Derouchey, J.; Seney, C.; Levesque, C.; Martin, P.; Stafford, C. M.; Russell, T. P. The Influence of Molecular Weight on Nanoporous Polymer Films Polymer 2001, 42, 9091-9095
25. Böker, A.; Elbs, H.; Hansel, H.; Knoll, A.; Ludwigs, S.; Zettl, H.; Zvelindovsky, A. V.; Sevink, G. J. A.; Urban, V.; Abetz, V.; Muller, A. H. E.; Krausch, G. Electric Field Induced Alignment of Concentrated Block Copolymer Solutions Macromolecules 2003, 36, 8078-8087
26. Kim, S. H.; Misner, M. J.; Xu, T.; Kimura, M.; Russell, T. P. Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation Adv. Mater. 2004, 16, 226-231
27. Metwalli, E.; Perlich, J.; Wang, W.; Diethert, A.; Roth, S. V.; Papadakis, C. M.; Müller-Buschbaum, P. Morphology of Semicrystalline Diblock Copolymer Thin Films upon Directional Solvent Vapor Flow Macromol. Chem. Phys. 2010, 211, 2102-2108
28. Angelescu, D. E.; Waller, J. H.; Register, R. a.; Chaikin, P. M. Shear-Induced Alignment in Thin Films of Spherical Nanodomains Adv. Mater. 2005, 17, 1878-1881
29. Zhang, X.; Harris, K. D.; Wu, N. L. Y.; Murphy, J. N.; Buriak, J. M. Fast Assembly of Ordered Block Microwave Annealing ACS Nano 2010, 4, 7021-7029
30. Gotrik, K. W.; Ross, C. A. Solvothermal Annealing of Block Copolymer Thin Films Nano Lett. 2013, 13, 5117-5122
31. Park, W. I.; Kim, K.; Jang, H.-I.; Jeong, J. W.; Kim, J. M.; Choi, J.; Park, J. H.; Jung, Y. S. Directed Self-Assembly with Sub-100 Degrees Celsius Processing Temperature, Sub-10 Nanometer Resolution, and Sub-1 Minute Assembly Time Small 2012, 8, 3762-3768
32. Sinturel, C.; Vayer, M.; Morris, M.; Hillmyer, M. A. Solvent Vapor Annealing of Block Polymer Thin Films Macromolecules 2013, 46, 5399-5415
33. Ferrarese Lupi, F.; Giammaria, T. J.; Ceresoli, M.; Seguini, G.; Sparnacci, K.; Antonioli, D.; Gianotti, V.; Laus, M.; Perego, M. Rapid Thermal Processing of Self-Assembling Block Copolymer Thin Films Nanotechnology 2013, 24, 315601
34. Seguini, G.; Giammaria, T. J.; Ferrarese Lupi, F.; Sparnacci, K.; Antonioli, D.; Gianotti, V.; Vita, F.; Placentino, I. F.; Hilhorst, J.; Ferrero, C.; Francescangeli, O.; Laus, M.; Perego, M. Thermally Induced Self-Assembly of Cylindrical Nanodomains in Low Molecular Weight PS-B-PMMA Thin Films Nanotechnology 2014, 25, 045301
35. Rasappa, S.; Borah, D.; Senthamaraikannan, R.; Faulkner, C. C.; Shaw, M. T.; Gleeson, P.; Holmes, J. D.; Morris, M. Block Copolymer Lithography: Feature Size Control and Extension by an over-Etch Technique Thin Solid Films 2012, 522, 318-323
36. Borah, D.; Senthamaraikannan, R.; Rasappa, S.; Kosmala, B.; Holmes, J. D.; Morris, M. Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique ACS Nano 2013, 7, 6583-6596
37. Busch, P.; Posselt, D.; Smilgies, D.; Rheinla, B.; Kremer, F.; Papadakis, C. M. Lamellar Diblock Copolymer Thin Films Investigated by Tapping Mode Atomic Force Microscopy: Molar-Mass Dependence of Surface Ordering Macromolecules 2003, 8717-8727
38. Black, C. T.; Guarini, K. W.; Breyta, G.; Colburn, M. C.; Ruiz, R.; Sandstrom, R. L.; Sikorski, E. M.; Zhang, Y. Highly Porous Silicon Membrane Fabrication Using Polymer Self-Assembly J. Vac. Sci. Technol. B 2006, 24, 3188
39. Andreozzi, A.; Poliani, E.; Seguini, G.; Perego, M. The Effect of Random Copolymer on the Characteristic Dimensions of Cylinder-Forming PS-b-PMMA Thin Films Nanotechnology 2011, 22, 185304
40. Ham, S.; Shin, C.; Kim, E.; Ryu, D. Y.; Jeong, U.; Russell, T. P.; Hawker, C. J. Microdomain Orientation of PS-b-PMMA by Controlled Interfacial Interactions Macromolecules 2008, 41, 6431-6437
41. Gianotti, V.; Antonioli, D.; Sparnacci, K.; Laus, M.; Giammaria, T. J.; Ferrarese Lupi, F.; Seguini, G.; Perego, M. On the Thermal Stability of PS-b-PMMA Block and P(S-r-MMA) Random Copolymers for Nanopatterning Applications Macromolecules 2013, 46, 8224-8234
42. Black, C. T.; Guarini, K. W. Structural Evolution of Cylindrical-Phase Diblock Copolymer Thin Films J. Polym. Sci., Part B: Polym. Phys. 2003, 1970-1975
43. Matsen, M. W.; Bates, F. S. Unifying Weak-and Strong-Segregation Block Copolymer Theories Macromolecules 1996, 29, 1091-1098
44. Zucchi, I.; Poliani, E.; Perego, M. Microdomain Orientation Dependence on Thickness in Thin Films of Cylinder-Forming PS-B-PMMA Nanotechnology 2010, 21, 185304
45. Daillant, J.; Quinn, K.; Gouriero, C.; Rieutordb, F. Grazing Incidence Surface Scattering of X-Rays J. Chem. Soc. Faraday Trans. 1996, 92, 505-513
46. Lee, B.; Park, I.; Yoon, J.; Park, S.; Kim, J.; Kim, K.-W.; Chang, T.; Ree, M. Structural Analysis of Block Copolymer Thin Films with Grazing Incidence Small-Angle X-Ray Scattering Macromolecules 2005, 38, 4311-4323
47. 2 and Beyond ACS Nano 2009, 3, 1844-1858
48. Vainshtein, B. K. Diffraction of X-Rays by Chain Molecules; Elsevier: Amsterdam, 1966; Vol. 4, p 227.
49. Kim, S. O.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; de Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
50. Sundrani, D.; Darling, S. B.; Sibener, S. J. Guiding Polymers to Perfection: Macroscopic Alignment of Nanoscale Domains Nano Lett. 2004, 4, 273-276
51. Cheng, J. Y.; Ross, C. A.; Smith, H. I.; Thomas, E. L. Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up Adv. Mater. 2006, 18, 2505-2521
52. Ferrarese Lupi, F.; Giammaria, T. J.; Seguini, G.; Laus, M.; Enrico, E.; De Leo, N.; Boarino, L.; Ober, C. K.; Perego, M. Thermally Induced Orientational Flipping of Cylindrical Phase Diblock Copolymers J. Mater. Chem. C 2014, 2, 2175-2182
53. Han, E.; Kang, H.; Liu, C.-C.; Nealey, P. F.; Gopalan, P. Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates Adv. Mater. 2010, 22, 4325-4329
54. Perego, M.; Andreozzi, A.; Vellei, A.; Ferrarese Lupi, F.; Seguini, G. Collective Behavior of Block Copolymer Thin Films within Periodic Topographical Structures Nanotechnology 2013, 24, 245301