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Volumn 6, Issue 10, 2014, Pages 7316-7324

Thermal and plasma-enhanced atomic layer deposition of TiN using TDMAT and NH3 on particles agitated in a rotary reactor

Author keywords

atomic layer deposition; optical emission spectroscopy; particle coating; plasma enhanced ALD; rotary reactor; titanium nitride

Indexed keywords

DEPOSITION; EMISSION SPECTROSCOPY; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84901649694     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am5007222     Document Type: Article
Times cited : (33)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.