A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Surface and Coatings Technology

Volumn 213, Issue , 2012, Pages 183-191

  Longrie, Delphine ^a   Deduytsche, Davy ^a   Haemers, Jo ^a   Driesen, Kris ^b   Detavernier, Christophe ^a  

^a GHENT UNIVERSITY   (Belgium)

^b UMICORE   (Belgium)

Author keywords

Atomic layer deposition; Nanoparticles; Rotary reactor

Indexed keywords

ALD GROWTH; ALN; CONFORMALITY; DEPOSITED FILMS; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; EX SITU; GLASS BEAD; HALF REACTIONS; MASS SPECTROSCOPY; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; ROTARY REACTOR; SMALL OBJECTS; TIO; TRANSMISSION ELECTRON MICROSCOPY TEM; X RAY FLUORESCENCE; ZNO NANOPOWDER;

DEPOSITS; ELECTRON SPECTROSCOPY; EMISSION SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; MASS SPECTROMETRY; NANOPARTICLES; TITANIUM; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAYS; ZINC OXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84870237175     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.10.045     Document Type: Article

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