SCOPUS 정보 검색 플랫폼

Volumn 214, Issue , 2014, Pages 91-95

Post-growth thermal oxidation of wurtzite InN thin films into body-center cubic In2O3 for chemical/gas sensing applications

(4) Liu, H F a Yakovlev, N L a Chi, D Z a Liu, W b

a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

Epitaxial oxidation; InN thin films; MOCVD; Rapid thermal annealing

Indexed keywords

DISSOCIATION; HETEROJUNCTIONS; INDIUM; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING; SAPPHIRE; SENSORS; SUPERCONDUCTING FILMS; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

ELEVATED TEMPERATURE; HIGH-RESOLUTION X-RAY DIFFRACTION; INN THIN FILMS; RAPID THERMAL ANNEALING (RTA); SENSING APPLICATIONS; SIMS DEPTH PROFILE; THERMAL DISSOCIATION;

OXIDATION;

EID: 84901036828 PISSN: 00224596 EISSN: 1095726X Source Type: Journal
DOI: 10.1016/j.jssc.2013.10.017 Document Type: Article

Times cited : (10)

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