Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition

Surface and Coatings Technology

Volumn 244, Issue , 2014, Pages 166-172

  Gao, Ming ^a   Ito, Akihiko ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Anatase; Laser CVD; Rutile; Thick film

Indexed keywords

COLUMNAR STRUCTURES; DEPOSITION TEMPERATURES; LASER CHEMICAL VAPOR DEPOSITION; LASER CVD; LASER WAVELENGTH; PHASE AND MICROSTRUCTURES; RUTILE; RUTILE AND ANATASE;

CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DEPOSITION RATES; FILM PREPARATION; LASER PULSES; MICROSTRUCTURE; OXIDE MINERALS; THICK FILMS; TITANIUM DIOXIDE; VAPORS;

NEODYMIUM LASERS;

EID: 84900353497     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2014.02.003     Document Type: Article

References (30)

1. Fujishima A., Rao T.N., Tryk D.A. J. Photochem. Photobiol. C. 2000, 1:1-21.
2. Nowotny J., Bak T., Nowotny M.K., Sheppard L.R. Energ. 2007, 32:2609-2629.
3. Ni M., Leung M.K.H., Leung D.Y.C., Sumathy K. Renew. Sustain. Energ. Rev. 2007, 11:401-425.
4. Hanaor D., Sorrell C. J. Mater. Sci. 2011, 46:855-874.
5. Augustynski J. Electrochimica Acta. 1993, 38:43-46.
6. Sclafani A., Herrmann J.M. J. Phys. Chem. 1996, 100:13655-13661.
7. Fuyuki T., Matsunami H. Jpn. J. Appl. Phys. 1986, 25:1288-1291.
8. Byun D., Jin Y., Kim B., Kee Lee J., Park D. J. Hazard. Mater. 2000, 73:199-206.
9. Lu J.-P., Wang J., Raj R. Thin Solid Films. 1991, 204:L13-L17.
10. Byun C., Jang J.W., Kim I.T., Hong K.S., Lee B.-W. Mater. Res. Bull. 1997, 32:431-440.
11. Krumdieck S., Raj R. Surf. Coat. Technol. 2001, 141:7-14.
12. Shalini K., Chandrasekaran S., Shivashankar S.A. J. Cryst. Growth. 2005, 284:388-395.
13. Tu R., Goto T. Mater. Trans. 2008, 49:2040-2046.
14. Fujishima A., Zhang X., Tryk D.A. Surface Science Reports. 2008, 63:515-582.
15. Goto T., Banal R., Kimura T. Surf. Coat. Technol. 2007, 201:5776-5781.
16. Kadokura H., Ito A., Kimura T., Goto T. Surf. Coat. Technol. 2010, 204:2302-2306.
17. Fujie K., Ito A., Tu R., Goto T. J. Alloys Compd. 2010, 502:238-242.
18. Gao M., Ito A., Tu R., Goto T. Key Eng. Mater. 2012, 508:287-290.
19. Gao M., Ito A., Tu R., Goto T. Key Eng. Mater. 2012, 508:279-282.
20. Dietrich T.R., Chiussi S., Stafast H., Comes F.J. Appl. Phys. A. 1989, 48:405-414.
21. Lindstam M., Boman M., Piglmayer K. Applied Surface Science. 2001, 172:200-206.
22. Molian P.A., Waschek A. J Mater Sci. 1993, 28:1733-1737.
23. Duty C., Johnson R., Bondi S. Chemical Vapor Deposition. 2003, 9:298-301.
24. Momma K., Izumi F. J. Appl. Crystallogr. 2011, 44:1272-1276.
25. Barrett C.S., Massalski T.B. Structure of Metals 1980, McGraw-Hill Book Company, Inc., New York. 3rd ed.
26. Ito A., Kadokura H., Kimura T., Goto T. J. Alloys Compd. 2010, 489:469-474.
27. Ramamoorthy M., Vanderbilt D., King-Smith R.D. Phys. Rev. B. 1994, 49:16721-16727.
28. Kang B.-C., Lee S.-B., Boo J.-H. Surf. Coat. Technol. 2000, 131:88-92.
29. Mathur S., Kuhn P. Surf. Coat. Technol. 2006, 201:807-814.
30. Bessergenev V.G., Khmelinskii I.V., Pereira R.J.F., Krisuk V.V., Turgambaeva A.E., Igumenov I.K. Vacuum. 2002, 64:275-279.