High Temperature Stability of Anatase Films Prepared by MOCVD

Materials Transactions

Volumn 49, Issue 9, 2008, Pages 2040-2046

  Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Anatase; Metal organic chemical vapor deposition (CVD); Phase transition; Rutile

Indexed keywords

ENERGY GAP; FILM PREPARATION; GALLIUM ALLOYS; INDUSTRIAL CHEMICALS; LIGHT REFRACTION; OPTICAL BAND GAPS; OPTICAL PROPERTIES; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; OXIDE MINERALS; PHASE TRANSITIONS; REFRACTIVE INDEX; REFRACTOMETERS; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPORS;

ANATASE; ANATASE FILMS; BANDGAP; HIGH-TEMPERATURE; NO PHASES; OPTICAL; OPTICAL BANDS; ORGANIC CHEMICAL VAPOR DEPOSITIONS; PHASE TRANSITION; RUTILE; SUBSTRATE TEMPERATURES;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 54549113287     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.MRA2008114     Document Type: Article

References (32)

1. Y. H. Zhang, C. K. Chan, J. F. Porter and W. Guo: J. Mater. Res. 13 (1998) 2602-2609.
2. A. L. Linsebigler, G. Q. Lu and J. T. Yates: Chem. Rev. 95 (1995) 735-758.
3. K. N. P. Kumar, K. Keizer and A. J. Burggraaf: J. Mater. Sci. Lett. 13 (1994) 59-61.
4. D. J. Kim, S. H. Hahn, S. H. Oh and E. J. Kim: Mater. Lett. 57 (2002) 355-360.
5. D. H. Kuo and K. H. Tzeng: Thin Solid Films 420-421 (2002) 497-502.
6. D. Mergel, D. Buschendorf, S. Eggert, R. Grammes and B. Samset: Thin Solid Films 371 (2000) 218-224.
7. D. J. Won, C. H. Wang, H. K. Jang and D. J. Choi: Appl. Phys. A 73 (2001) 595-600.
8. B. Kim, D. Byun, J. K. Lee and D. Park: Jpn. J. Appl. Phys. 41 (2002) 222-226.
9. W. Li, C. Ni, H. Lin, C. P. Huang and S. Ismat Shah: J. Appl. Phys. 96 (2004) 6663-6668.
10. X. Ding, L. Liu, X. Ma, Z. Qi and Y. He: J. Mater. Sci. Lett. 13 (1994) 462-464.
11. C. Suresh, V. Biju, P. Mukundan and K. G. K. Warrier: Polyhedron 17 (1998) 3131-3135.
12. D. Wicaksana, A. Kobayashi and A. Kinbara: J. Vacuum Sci. Tech. A 10 (1992) 1479-1482.
13. Y. Sun, T. Egawa, L. Zhang and X. Yao: Jpn. J. Appl. Phys. Part 2-Lett. 41 (2002) L945-L948.
14. Y. J. Sun, A. Z. Li, M. Qi, L. Y. Zhang and X. Yao: Mater. Sci. Eng. B 86 (2001) 185-188.
15. C. S. Kim, K. Nakaso, B. Xia, K. Okuyama and M. Shimada: Aerosol Sci. Tech. 39 (2005) 104-112.
16. R. Tu, T. Kimura and T. Goto: Mater. Trans. 43 (2002) 2354-2356.
17. M. Lazzeri, A. Vittadini and A. Selloni: Phys. Rev. B 63 (2001) 155409-1-9.
18. U. Diebold, N. Ruzycki, G. S. Herman and A. Selloni: Catalysis Today 85 (2003) 93-100.
19. M. Ramamoorthy, D. Vanderbilt and R. D. King-Smith: Phys. Rev. B 49 (1994) 16721-16727.
20. S. Krumdieck and R. Raj: Surf. Coat. Tech. 141 (2001) 7-14.
21. T. Kimura and T. Goto: Surf. Coat. Tech. 198 (2005) 129-132.
22. T. Kimura, R. Tu and T. Goto: J. Japan Inst. Metals 69 (2005) 12-16. 23 ) International Centre for Diffraction Data, No. 21 -1276, Joint Comittee on Powder Diffraction Standards.
23. H. Tang, K. Prasad, R. Sanjinès, P. E. Schmid and F. Levy: J. Appl. Phys. 75 (1994) 2042-2047.
24. D. Mardare, M. Tasca, M. Delibas and G. I. Rusu: Appl. Surf. Sci. 156 (2000) 200-206.
25. N. Daude, C. Gout and C. Jouanin: Phys. Rev. B 15 (1977) 3229-3235.
26. L. J. Meng and M. P. Dos Santos: Thin Solid Films 226 (1993) 22-29.
27. G. S. Brady and H. R. Clauser: Mater. Handbook. 13th ed., McGrawHill, New York, 1991.
28. P. J. Huang, H. Chang, C. T. Yeh and C. W. Tsai: Thermochimica Acta 297 (1997) 85-92.
29. R. Arroyo, G. Cordoba, J. Padilla and V. H. Lara: Mater. Lett. 54 (2002) 397-402.
30. H. Zhang and J. F. Banfield: J. Phys. Chem. B 104 (2000) 3481 -3487.
31. G. He, Q. Fang, L. Zhu, M. Liu and L. Zhang: Chem. Phys. Lett. 395 (2004) 259-263.
32. E. San Andres, M. Toledano-Luque, A. del Prado, M. A. Navacerrada, I. Mártil, G. Gonzalez-Diaz, W. Bohne, J. Röhrich and E. Strub: J. Vac. Sci. Technol. A 23(6) (2005) 1523-1530.