Laser chemical vapor deposition of SiC films with CO2 laser

Journal of Alloys and Compounds

Volumn 502, Issue 1, 2010, Pages 238-242

  Fujie, Kengo ^a   Ito, Akihiko ^a   Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Coating; Laser CVD; Microstructure; Silicon carbide

Indexed keywords

DEPOSITION CONDITIONS; DEPOSITION TEMPERATURES; HEXAMETHYLDISILANES; LASER CHEMICAL VAPOR DEPOSITION; LASER CVD; LASER POWER; MICROSTRUCTURE SILICON; SIC FILMS;

CHEMICAL VAPOR DEPOSITION; COATINGS; DEPOSITION; DEPOSITION RATES; MICROSTRUCTURE;

SILICON CARBIDE;

EID: 77954213586     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.04.154     Document Type: Article

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