Biomimetic, antireflective, superhydrophobic and oleophobic PMMA and PMMA-coated glass surfaces fabricated by plasma processing

Microelectronic Engineering

Volumn 121, Issue , 2014, Pages 33-38

  Kontziampasis, D ^a,b   Boulousis, G ^a   Smyrnakis, A ^a   Ellinas, K ^a   Tserepi, A ^a   Gogolides, E ^a,b  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Antireflective; Biomimetic; Oleophobic; Plasma nanotexturing; Superamphiphobic; Superhydrophobic

Indexed keywords

ANTI-REFLECTIVE; OLEOPHOBIC; PLASMA NANOTEXTURING; SUPERAMPHIPHOBIC; SUPERHYDROPHOBIC;

BIOMIMETICS; GLASS; PLASMA APPLICATIONS; PLASMA ETCHING; PLASMAS; SELF ASSEMBLED MONOLAYERS;

HYDROPHOBICITY;

EID: 84898076661     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2014.02.027     Document Type: Article

References (47)

1. K. Forberich, G. Dennler, M.C. Scharber, K. Hingerl, T. Fromherz, and C.J. Brabec Thin Solid Films 516 2008 7167
2. J.A. Hiller, J.D. Mendelsohn, and M.F. Rubner Nat. Mater. 1 2002 59
3. S. Chattopadhyay, L.C. Chen, and K.H. Chen Crit. Rev. Solid State Mater. Sci. 31 2006 15
4. H. Kikuta, H. Toyota, and W. Yu Opt. Rev. 10 2003 63
5. H.L. Chen, S.Y. Chuang, C.H. Lin, and Y.H. Lin Opt. Express 15 2007 14793
6. Y. Kanamori, M. Sasaki, and K. Hane Opt. Lett. 24 1999 1422
7. B. Päivänranta, P.K. Sahoo, E. Tocce, V. Auzelyte, Y. Ekinci, H.H. Solak, C.-C. Liu, K.O. Stuen, P.F. Nealey, and C. David ACS Nano. 5 3 2011 1860
8. Y. Kanamori, K. Hane, H. Sai, and H. Yugami Appl. Phys. Lett. 78 2001 42
9. E. Gogolides, V. Constantoudis, G. Kokkoris, D. Kontziampasis, K. Tsougeni, G. Boulousis, M. Vlachopoulou, and A. Tserepi J. Phys. D 44 2011 17 (art no 174021)
10. D. Kontziampasis, V. Constantoudis, and E. Gogolides Plasma. Proc. Polym. 9 9 2012 866
11. N. Vourdas, D. Kontziampasis, G. Kokkoris, V. Constantoudis, A. Goodyear, A. Tserepi, M. Cooke, and E. Gogolides Nanotechnology 21 8 2010 (art no. 085302)
12. E. Gogolides, M. Vlachopoulou, K. Tsougeni, N. Vourdas, and A. Tserepi Int. J. Nanomanuf. 6 1 2010 152 163
13. K. Ostrikov, E.C. Neyts, and M. Meyyappan Adv. Phys. 62 2013 113
14. S. Xu, I. Levchenko, S.Y. Huang, and K. Ostrikov Appl. Phys. Lett. 95 2009 111505
15. R. Di Mundo, M. Ambrico, P.F. Ambrico, R. d'Agostino, F. Italiano, and F. Palumbo Plasma. Process. Polym. 8 2011 239
16. J. Fresnais, J.P. Chapel, and F. Poncin-Epaillard Surf. Coat. Technol. 200 2006 5296
17. R. Di Mundo, R.F. Palumbo, and R. d'Agostino Langmuir 24 2008 5044
18. A. Kaless, U. Schulz, P. Munzert, and N. Kaiser Surf. Coat. Technol. 200 2005 58
19. U. Schulz, P. Munzert, R. Leitel, I. Wendling, N. Kaiser, and N.A. Tunnermann Opt. Express 20 2007 13108
20. R. Di Mundo, M. Troia, F. Palumbo, M. Trotta, and R. d'Agostino Plasma Process. Polym 9 2012 947
21. R. Di Mundo, V. De Venedictis, F. Palumbo, and R. d' Aghostino Apl. Surf. Sci. 255 2009 54 61
22. Z. Guo, W. Liu, and B.-L. Su J. Colloid Interf. Sci. 353 2011 335 355
23. Y.Y. Yan, N. Gao, and W. Barthlott Adv. Colloid. Interfac. 169 2011 80 105
24. Z. Xue, M. Liu, and L. Jiang J. Polym. Sci B: Pol. Phys. 50 2012 1209 1224
25. K. Ellinas, A. Tserepi, and E. Gogolides Langmuir 27 27 2011 3960 3969
26. N.E. Vourdas, M.E. Vlachopoulou, A. Tserepi, and E. Gogolides Int. J. Nanotechnol. 6 1 2009 196 207
27. K. Tsougeni, P.S. Petrou, A. Tserepi, S.E. Kakabakos, and E. Gogolides Microelec. Eng. 86 4 2009 1424 1427
28. N. Vourdas, A. Tserepi, A.G. Boudouvis, and E. Gogolides Microelec. Eng. 85 2008 1124
29. A.N. Parikh, and D.L. Allara J. Phys. Chem. 98 1994 7577 7590
30. M. Psarski et al. Cent. Eur. J. Phys. 10 5 2012 1197 1201
31. A. Ressine, D. Finnskog, G. Marko-Varga, and T. Laurell Nanobiotechnology 4 2008 18 27
32. A.Y. Fadeev, and T.J. McCarthy Langmuir 16 2000 7268
33. P.S. Tsai, Y.M. Yang, and Y.L. Lee Nanotechnology 18 465604 2007 7
34. J.X.H. Wong, H. Asanuma, and H.-Z. Yu Thin Solid Films 522 2012 159
35. Z. Zheng, Z. Gu, R. Huo, and Y. Ye Appl. Surf. Sci. 255 2009 7263
36. C.-T. Hsieh, F.-L. Wu, and W.-Y. Chen Mater. Chem. Phys. 121 2010 14
37. T. Wang, T.T. Isimjan, J. Chen, and S. Rohani Nanotechnology 22 2011 265708
38. H. Sugimura, A. Hozumi, T. Kameyama, and O. Takai Surf. Interf. Anal. 34 2002 550 554
39. M. Zhang, S. Wang, C. Wang, and J. Li Appl. Surf. Sci. 261 2012 561 566
40. Y. Xiu, D.W. Hess, and C.P. Wong J. Colloid. Interf. Sci. 326 2008 465
41. X. Song, J. Zhai, Y. Wang, and L. Jiang J. Colloid. Interf. Sci. 298 2006 267
42. M.-J. Oh, S.-Y. Lee, and K.-H. Paik J. Ind. Eng. Chem. 17 2011 149
43. G. Saini, K. Sautter, F.E. Hild, J. Pauley, and M.R. Linford J. Vac. Sci. Technol. A 26 2008 1221
44. J. Zimmerman, M. Rabe, G.R.J. Artus, and S. Seeger Soft Matter 4 2008 450 452
45. A.K. Gnanappa, D.P. Papageorgiou, E. Gogolides, A. Tserepi, A.G. Papathanasiou, and A.G. Boudouvis Plasma Process. Polym. 9 3 2012 304 315
46. M. Kitsara, P. Petrou, D. Kontziampasis, K. Misiakos, E. Makarona, I. Raptis, and K. Beltsios Microelec Eng 87 2010 802 805
47. G. Kokkoris, V. Constantoudis, P. Angelikopoulos, G. Boulousis, and E. Gogolides Phys. Rev. B 76 2007 193405