Antireflection of transparent polymers by advanced plasma etching procedures

Optics Express

Volumn 15, Issue 20, 2007, Pages 13108-13113

  Schulz, U ^a   Munzert, P ^a   Leitel, R ^b   Wendling, I ^b   Kaiser, N ^a   Tunnermann A ^a,b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT REFLECTION; NANOSTRUCTURES; POLYMER FILMS; POLYMER MATRIX; POLYMETHYL METHACRYLATES;

ANTIREFLECTIVE STRUCTURES; SELF-ORGANIZED NANOSTRUCTURES; TRANSPARENT POLYMERS;

PLASMA ETCHING;

EID: 35148829376     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.013108     Document Type: Article

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