Nanofabrication of broad-band antireflective surfaces using self-assembly of block copolymers

ACS Nano

Volumn 5, Issue 3, 2011, Pages 1860-1864

  Päivänranta, Birgit ^a   Sahoo, Pratap K ^a   Tocce, Elizabeth ^b   Auzelyte, Vaida ^a   Ekinci, Yasin ^a,c   Solak, Harun H ^a   Liu, Chi Chun ^b   Stuen, Karl O ^b   Nealey, Paul F ^b   David, Christian ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b University of Wisconsin Madison   (United States)

^c ETH ZURICH   (Switzerland)

Author keywords

antireflection; block copolymers; broad band; nanofabrication; subwavelength gratings

Indexed keywords

ANTI-REFLECTION; ANTIREFLECTIVE; BROAD BANDS; BROAD-BAND; COST-EFFECTIVE METHODS; FUSED SILICA SUBSTRATES; GRADED INDEX; NANOFABRICATION; NEAR-INFRARED RANGE; PATTERN TRANSFERS; PERIODIC PATTERN; RIGOROUS DIFFRACTION THEORY; SILICA SURFACE; SPECTRAL MEASUREMENT; SUB-WAVELENGTH; SUBWAVELENGTH GRATINGS;

BLOCK COPOLYMERS; COPOLYMERIZATION; NANOSTRUCTURES; OPTICAL PROPERTIES; PLASMA ETCHING; PLASTIC PRODUCTS; SELF ASSEMBLY; SILICA;

FUSED SILICA;

NANOMATERIAL; POLYMER;

ABSORPTION; ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; LIGHT; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; REFRACTOMETRY; SURFACE PROPERTY; ULTRASTRUCTURE;

ABSORPTION; CRYSTALLIZATION; LIGHT; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; PARTICLE SIZE; POLYMERS; REFRACTOMETRY; SURFACE PROPERTIES;

EID: 79952935669     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn103361d     Document Type: Article

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