Single-step plasma process producing anti-reflective and photovoltaic behavior on crystalline silicon

Plasma Processes and Polymers

Volumn 8, Issue 3, 2011, Pages 239-245

  Di Mundo, Rosa ^a   Ambrico, Marianna ^b   Ambrico, Paolo Francesco ^b   D'Agostino, Riccardo ^a   Italiano, Francesca ^a   Palumbo, Fabio ^b  

^a UNIVERSITY OF BARI   (Italy)

^b CNR   (Italy)

Author keywords

antireflective; crystalline silicon; nanotexturing structuring; photovoltaic; plasma etching

Indexed keywords

ANTIREFLECTIVE; CHEMICAL FEATURES; CRYSTALLINE SILICONS; DOPING PROCEDURE; IONIC FORMS; MASK LESS; NANO SCALE; NANOTEXTURING; NANOTEXTURING/STRUCTURING; PHOTOVOLTAIC; PLASMA CONDITIONS; PLASMA MODIFICATIONS; PLASMA PROCESS; SILICON SURFACES; SINGLE-STEP; SPECULAR REFLECTANCE; TOTAL REFLECTANCE; WIDELY TUNABLE;

CRYSTALLINE MATERIALS; CURRENT VOLTAGE CHARACTERISTICS; FLUORINE; PLASMA ETCHING; PLASMAS; REACTIVE ION ETCHING; REFLECTION; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOVOLTAIC EFFECTS;

EID: 79952689941     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201000148     Document Type: Article

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