Nano-texturing of transparent polymers with plasma etching: Tailoring topography for a low reflectivity

Plasma Processes and Polymers

Volumn 9, Issue 10, 2012, Pages 947-954

  Di Mundo, Rosa ^a   Troia, Mariagrazia ^a   Palumbo, Fabio ^b   Trotta, Massimo ^b   D'Agostino, Riccardo ^a,b  

^a UNIVERSITY OF BARI   (Italy)

^b CNR   (Italy)

Author keywords

antireflective; moth eye effect; nanostructured surface; plasma etching

Indexed keywords

ANTIREFLECTIVE; DIFFUSE COMPONENTS; FEED RATIOS; GRAZING INCIDENCE; HOMOGENEOUS DISTRIBUTION; MOTHEYE; NANOSTRUCTURED SURFACE; NANOTEXTURED; NANOTEXTURING; PLASMA PROCESS; SELF-ORGANIZED NANOSTRUCTURES; SPECULAR REFLECTANCE; TRANSPARENT MATERIAL; TRANSPARENT POLYMER; TREATMENT DURATION; TREATMENT TIME; VISIBLE AND NEAR INFRARED;

PHOTOELECTRONS; PLASMA ETCHING; REFLECTION; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMERS;

EID: 84867550887     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201200041     Document Type: Article

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