SCOPUS 정보 검색 플랫폼

Volumn 4, Issue 29, 2014, Pages 15131-15137

Optical emission spectroscopy diagnostic and thermodynamic analysis of thermal plasma enhanced nanocrystalline silicon CVD process

(5) Cao, Tengfei a Zhang, Haibao a Yan, Binhang a Lu, Wei a Cheng, Yi a

a TSINGHUA UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMS; DEPOSITION RATES; EMISSION SPECTROSCOPY; LIGHT EMISSION; NANOCRYSTALLINE SILICON; THERMOANALYSIS;

CRYSTALLINE FRACTIONS; CRYSTALLINE SILICON MATERIALS; LINEAR RELATIONSHIPS; MECHANISM OF DEPOSITIONS; OPTICAL EMISSION SPECTROSCOPIES (OES); PHOTOVOLTAIC INDUSTRY; THERMO DYNAMIC ANALYSIS; THERMODYNAMIC EQUILIBRIUM CALCULATION;

DEPOSITION;

EID: 84897143372 PISSN: None EISSN: 20462069 Source Type: Journal
DOI: 10.1039/c4ra01306a Document Type: Article

Times cited : (16)

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