Study of an argon-hydrogen RF inductive thermal plasma torch used for silicon deposition by optical emission spectroscopy

Solar Energy Materials and Solar Cells

Volumn 72, Issue 1-4, 2002, Pages 361-371

  Bourg, F ^a   Pellerin, S ^b   Morvan, D ^a   Amouroux, J ^a   Chapelle, J ^b  

^a PSL RESEARCH UNIVERSITY   (France)

^b Centre Universitaire de Bourges   (France)

Author keywords

Hydrogenation; Optical emission spectroscopy; Plasma diagnostic

Indexed keywords

ARGON; CRYSTALLOGRAPHY; DEPOSITION; DIFFUSION; DISLOCATIONS (CRYSTALS); ELECTRONIC DENSITY OF STATES; ELECTRONIC PROPERTIES; EMISSION SPECTROSCOPY; HYDROGEN; HYDROGENATION; PLASMA DIAGNOSTICS; PLASMA TORCHES; SUBSTRATES;

OPTICAL EMISSION SPECTROSCOPY (OES); THERMAL PLASMA TORCHES;

SEMICONDUCTING SILICON;

EID: 0036533188     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(01)00184-2     Document Type: Conference Paper

References (7)