Polysilicon prepared from SiCl4 by atmospheric-pressure non-thermal plasma

Plasma Science and Technology

Volumn 13, Issue 5, 2011, Pages 567-570

  Li, Xiaosong ^a   Wang, Nan ^a   Yang, Jinhua ^a   Wang, Younian ^a   Zhu, Aimin ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

atmospheric pressure; non thermal plasma; optical emission spec trum; polysilicon

Indexed keywords

ALTERNATING CURRENT; CRYSTALLINE SILICONS; NONTHERMAL PLASMA; OPTICAL EMISSION SPEC-TRUM; OPTICAL EMISSION SPECTRA; POLYSILICON DEPOSITION; POSITIVE PULSE; POWER SOURCES; POWER SUPPLY;

ATMOSPHERIC PRESSURE; EMISSION SPECTROSCOPY; LIGHT EMISSION;

POLYSILICON;

EID: 80055019057     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/13/5/11     Document Type: Article

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