Designing new materials and processes for directed self-assembly applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Chang, Shih Wei ^a   Vogel, Erin E ^b   Ginzburg, Valeriy V ^b   Murray, Daniel J ^b   Kramer, John W ^b   Weinhold, Jeffrey D ^b   Chuang, Vivian P W ^a   Sharma, Rahul ^b   Evans, Jessica P ^b   Landes, Brian ^b   Ge, Shouren ^b   Trefonas III, Peter ^a   Hustad, Phillip D ^b  

^a Dow Electronic Materials   (United States)

^b DOW CHEMICAL COMPANY   (United States)

Author keywords

BCP; Block copolymer; directed self assembly; DSA; graphoepitaxy; PS PMMA

Indexed keywords

BLOCK COPOLYMERS; ESTERS; MATERIALS; SELF ASSEMBLY; STYRENE; TECHNOLOGY;

BCP; DIRECTED SELF-ASSEMBLY; DSA; GRAPHOEPITAXY; PS-PMMA;

STRENGTH OF MATERIALS;

EID: 84894474234     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916429     Document Type: Conference Paper

References (28)

1. Bates, F. S., Fredrickson, G. H. "Block copolymers- designer soft materials," Phys. Today, 52, 32-38 (1999).
2. Hillmyer, M. A. "Nanoporous Materials from Block Copolymer Precursors", Adv. Polym. Sci., 190, 137-181 (2005).
3. Hadjichristidis, N., Pispas, S., and Floudas, G., [Block Copolymers: Synthetic Strategies, Physical Properties, and Applications], Wiley-Interscience, Hoboken, N.J., (2003).
4. Cheng, J. Y., Ross, C. A., Smith, H. I., and Thomas, E. L. "Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up," Adv. Mater., 18, 2505 (2006).
5. Black, C. T. "Polymer Self-Assembly as a Novel Extension to Optical Lithography," ACS Nano, 1, 147 (2007).
6. Segalman, R. A., "Patterning with Block Copolymer Thin Films," Mater. Sci. Eng., R, 48, 191-226 (2005).
7. Kim, S. O., Solak, H. H., Stoykovich, M. P., Ferrier, N. J., de Pablo, J. J., and Nealey, P. F., "Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates," Nature, 424, 411 (2003).
8. Cheng, J. Y., Rettner, C. T., Sanders, D. P., Kim, H-C., Hinsberg, W. D., "Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers," Adv. Mater., 20(16), 3155 (2008).
9. Liu, C.-C., Han, E., Onses, M. S., Thode, C. J., Ji, S., Gopalan, P., Nealey, P. F., "Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats," Macromolecules, 44, 1876 (2011).
10. Cheng, J. Y., Sanders, D. P., Truong, H. D., Harrer, S., Friz, A., Holmes, S., Colburn, M., Hinsberg, W. D., "Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist," ACS Nano, 4, 4815-4823 (2010).
11. Mansky, P., Russell, T. P., Hawker, C. J., Mays, J., Cook, D. C. and Satija, S. K. " Interfacial Segregation in Disordered Block Copolymers: Effect of Tunable Surface Potentials," Phys. Rev. Lett., 79, 237 (1997).
12. Russell, T. P., Hjelm, R. P., Seeger, P. A. "Temperature dependence of the interaction parameter of polystyrene and poly(methyl methacrylate)," Macromolecules, 23, 890-893 (1990).
13. Sivaniah, E., Matsubara, S., Zhao, Y., Hashimoto, T., Fukunaga, K., Kramer, E. J., Mates, T. E. "Symmetric Diblock Copolymer Thin Films on Rough Substrates: Microdomain Periodicity in Pure and Blended Films," Macromolecules, 41, 2584-2592 (2008).
14. Ji, S., Liu, C.-C., Son, J. G., Gotrik, K., Gordon, S. W. C., Gopalan, P., Himpsel, F. J., Char, K., Nealey, P. F., "Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films," Macromolecules, 41, 9098 (2008).
15. Segalman, R. A., Yokoyama, H., Kramer, E. J., "Graphoepitaxy of Spherical Domain Block Copolymer Films," Adv. Mater., 13, 1152 (2001).
16. Ruiz, R., Sandstrom, R. L., and Black, C. T., "Induced Orientational Order in Symmetric Diblock Copolymer Thin Films," Adv. Mater., 19, 587-591 (2007).
17. Park, S-M., Rettner, C. T., Pitera, J. W., and Kim, H-C. "Directed Self-Assembly of Lamellar Microdomains of Block Copolymers Using Topographic Guiding Patterns," Macromolecules, 42, 5895-5899 (2009).
18. Park, S-M., Stoykovich, M. P., Ruiz, R., Zhang, Y., Black, C. T., and Nealey, P. F. "Directed Assembly of Lamellae-Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates," Adv. Mater., 19, 607-611 (2007).
19. Sundrani, D., Darling, S. B., Sibener, S. J., "Hierarchical Assembly and Compliance of Aligned Nanoscale Polymer Cylinders in Confinement," Langmuir, 20 (12), 5091-5099 (2004).
20. Hammond, M. R., Cochran, E., Fredrickson, G. H., Kramer, E. J., "Temperature Dependence of Order, Disorder and Defects in Laterally Confined Diblock Copolymer Cylinder Monolayers," Macromolecules, 38, 6575-6585 (2005).
21. Jung, Y. S., Ross, C. A., "Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene-Polydimethylsiloxane Block Copolymer," Nano Lett., 7, 2046 (2007).
22. Jung, Y. S., Chang, J. B., Verploegen, E., Berggren, K. K., Ross, C. A., "A Path to Ultranarrow Patterns Using Self-Assembled Lithography," Nano Lett., 10, 1000 (2010).
23. Chu, J. H., Rangarajan, P., Adams, J. L., and Register, R. A., "Morphologies of strongly segregated polystyrenepoly(dimethylsiloxane) diblock copolymers," Polymer, 36, 1569-1575 (1995).
24. DePablo, J. Sematech DSA workshop, 2011.
25. Yokoyama, H., "Diffusion of Block Copolymers," Mat. Sci. and Eng. R, 2006, 5-6, 199 (2006).
26. Hashimoto, T., Shibayama, M., Kawai, H., "Ordered structure in block polymer solutions. 4. Scaling rules on size of fluctuations with block molecular weight, concentration, and temperature in segregation and homogeneous regimes,"Macromolecules, 16, 1093 (1983).
27. rd edition], Marcel Dekker, New York-Basel (2002).
28. Matsen, M. W., Bates, F. S., "Unifying Weak- and Strong-Segregation Block Copolymer Theories,"Macromolecules, 29, 1091-1098 (1996).