메뉴 건너뛰기




Volumn 26, Issue 8, 2014, Pages 1207-1216

Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approach

Author keywords

block copolymers; nanowires; patterning; photoelectron spectroscopy; silicon

Indexed keywords


EID: 84894423157     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201304096     Document Type: Article
Times cited : (38)

References (38)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.