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Volumn 295, Issue , 2014, Pages 8-17

Optical transitions and point defects in F:SnO 2 films: Effect of annealing

Author keywords

Atomic force microscopy; Defects; Electrical properties; FTO; Optical properties; Thin films; Tin oxide; Transparent conducting oxides

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; BOROSILICATE GLASS; CONDUCTIVE FILMS; CRACKING (CHEMICAL); DEFECTS; DISSOCIATION; ELECTRIC PROPERTIES; FLUORINE; HALL MOBILITY; LIGHT ABSORPTION; OPTICAL PROPERTIES; OPTICAL TRANSITIONS; OXIDE MINERALS; OXYGEN; OXYGEN VACANCIES; POINT DEFECTS; SPRAY PYROLYSIS; THIN FILMS; TIN OXIDES; TITANIUM DIOXIDE; TRANSPARENT CONDUCTING OXIDES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84894078132     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.12.057     Document Type: Article
Times cited : (42)

References (56)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.