Electrical and optical properties of fluorine-doped tin oxide (SnOx:F) thin films deposited on PET by using ECR-MOCVD

Journal of Electroceramics

Volumn 23, Issue 2-4, 2009, Pages 506-511

  Park, Ji Hun ^a,b   Byun, Dong Jin ^b   Lee, Joong Kee ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

ECR MOCVD; Electrical conductivity; Optical transmittance; PET; SnOx:F

Indexed keywords

CHEMICAL BONDINGS; DEPOSITION TIME; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CONDUCTIVITY; ELECTRICAL RESISTIVITY; FLUORINE DOPED TIN OXIDE; FLUORINE DOPING; FOUR-POINT PROBE METHOD; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; MOLE RATIO; OPTICAL TRANSMITTANCE; PLASTIC SUBSTRATES; POLYCRYSTALLINE STRUCTURE; PROCESS PARAMETERS; SEM; SHARP INCREASE; SURFACE RESISTIVITY; TEM; UV VISIBLE SPECTROSCOPY; VISIBLE-WAVELENGTH RANGE; XRD ANALYSIS;

ATOMIC EMISSION SPECTROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL BONDS; CYCLOTRONS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRON CYCLOTRON RESONANCE; ELECTRONS; FLUORINE; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOCOMPOSITES; OPACITY; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TIN; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 73449143192     PISSN: 13853449     EISSN: 15738663     Source Type: Journal    
DOI: 10.1007/s10832-008-9522-2     Document Type: Article

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