Preparation of fluorine-doped tin oxide films at low substrate temperature by an advanced spray pyrolysis technique, and their characterization

Semiconductor Science and Technology

Volumn 25, Issue 11, 2010, Pages

  Shewale, P S ^a   Patil, S I ^b   Uplane, M D ^a  

^a SHIVAJI UNIVERSITY   (India)

^b UNIVERSITY OF PUNE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM FLUORIDE; DEGENERATE SEMICONDUCTORS; DIFFERENT SUBSTRATES; ELECTRICAL CONDUCTIVITY; FLUORINE DOPED TIN OXIDE; FLUORINE-DOPED TIN OXIDE FILMS; GLASS SUBSTRATES; HALL EFFECT MEASUREMENT; HEAVILY DOPED; LOW SUBSTRATE TEMPERATURE; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL TRANSMITTANCE; POLYCRYSTALLINE; SPRAY-PYROLYSIS TECHNIQUES; STANNIC CHLORIDE; SUBSTRATE TEMPERATURE; TETRAGONAL CRYSTAL STRUCTURE; XRD STUDIES;

AMMONIUM COMPOUNDS; CHLORINE COMPOUNDS; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; FLUORINE; NANOCOMPOSITES; OXIDE FILMS; SPRAY PYROLYSIS; SUBSTRATES; TIN; TIN OXIDES;

FILM PREPARATION;

EID: 78649936085     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/25/11/115008     Document Type: Article

References (33)

1. Kim K H, Park N M, Kim T Y, Cho K S, Lee J I, Chu H Y and Sung G Y 2005 ETRI J. 27 4
2. Presley R E, Munsee C L, Park C-H, Hong D, Wager J F and Keszler D A 2004 J. Phys. D: Appl. Phys. 37 2810
3. Russo B and Cao G Z 2008 Appl. Phys. A 90 311
4. Dutta J, Roubeau P, Emeraud T, Laurent J-M, Smith A, Leblanc F and Perrin J 1994 Thin Solid Films 239 150
5. Patil P S, Sadale S B, Mujawar S H, Shinde P S and Chigare P S 2007 Appl. Surf. Sci. 253 8560
6. Huafu Z, Hanfa L, Chengxin L, Aiping Z and Changkun Y 2010 J. Semicond. 31 8
7. Chopra K L, Major S and Pandya D K 1983 Thin Solid Films 102 1
8. Yu B, Zhu C and Gan F 1997 Opt. Mater. 7 15
9. Tang Z K, Wong G K L, Yu P, Kawasaki M, Ohtomo A, Koinuma H and Segawa Y 1998 Appl. Phys. Lett. 72 3270
10. Stjenna B and Granqvist C G 1990 Sol. Energy Mater. 20 225
11. Brown J R, Haycock P W, Smith L M, Jones A C and Williams E W 2000 Sensors Actuators B 63 109
12. Quaas M, Eggs C and Wulff H 1998 Thin Solid Films 322 277
13. Paine D C, Whiston T, Janiac D, Bersford R, Yang C O and Lewis B 1999 J. Appl. Phys. 85 8445
14. Martin E I J, Yan M, Lane M, Ireland J, Kannewurf C R and Chang R P H 2004 Thin Solid Films 461 309
15. Ramaiah K S, Raja V S, Bhatnagar A K, Tomlinson R D, Pilkington R D, Hill A E, Chang S J, Su Y K and Juang F S 2000 Semicond. Sci. Technol. 15 676
16. Keshmiri S M, Roknabadi M R and Ashok S 2002 Thin Sold Films 413 167
17. Elangovan E and Ramamurthi K 2003 J. Optoelec. Adv. Mater. 5 45
18. Rozati S M and Ganj T 2004 Renew. Energy 29 1671
19. Martinez A I and Acosta D R 2005 Thin Solid Films 483 107
20. Martinez A I, Huerta L, O-Rueda de Léon J M, Acosta D, Malik O and Aguilar M 2006 J. Phys. D: Appl. Phys. 39 5091
21. Moholkar A V, Pawar S M, Rajpure K Y and Bhosale C H 2007 Mater. Lett. 61 3030
22. Moholkar A V, Pawar S M, Rajpure K Y, Almari S N, Patil P S and Bhosale C H 2008 Solid Energy Mater. Solar Cells 92 1439
23. Kim H, Kushto G P, Auyeung R C Y and Piqué A 2008 Appl. Phys. A 93 521
24. Vijayalakshmi S, Venkataraj S, Subramanian M and Jayavel R 2008 J. Phys. D: Appl. Phys. 41 035505
25. Elangovan E and Ramamurthi K 2005 Appl. Surf. Sci. 249 183
26. Gordon R G 2000 M R S Bull. 25 52
27. Seki H, Ishizawa N, Mizutani N, Kato M and Yogyo K 1984 J. Ceram. Assoc. Japan. 92 219
28. Vishwakarma S, Upadhyay J and Prasad H 1989 Thin Solid Films 176 99
29. Shin H H, Joung Y H and Kang S J 2009 J. Mater. Sci. Mater. Electron. 20 704
30. Jain A, Sagar P and Mehra R M 2007 Mater. Sci.-Poland 25 1
31. Hamberg I and Granqvist C G 1986 J. Appl. Phys. 60 R123
32. Hiechou A E, Kachou A, Bubendroff J I, Addou M, Ebothe J, Troyon M and Bougrine S 2004 Thin Solid Films 458 263
33. Mavrodiev G, Gajdardziska M and Novkovski N 1984 Thin Solid Films 113 93