Reactively magnetron sputtered Bi2O3 thin films: Analysis of structure, optoelectronic, interface, and photovoltaic properties

Physica Status Solidi (A) Applications and Materials Science

Volumn 211, Issue 1, 2014, Pages 93-100

  Morasch, Jan ^a   Li, Shunyi ^a   Brötz, Joachim ^a   Jaegermann, Wolfram ^a   Klein, Andreas ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Bi2O3; magnetron sputtering; photovoltaic properties; thin film

Indexed keywords

ENERGY BARRIER HEIGHT; ENERGY-BAND ALIGNMENT; PHOTOVOLTAIC PROPERTY; RELATIVE PERMITTIVITY; RF-MAGNETRON SPUTTERING; THIN FILM SOLAR CELLS; TRANSMISSION SPECTROSCOPY; UV PHOTOELECTRON SPECTROSCOPY;

ELECTRIC CONTACTS; MAGNETRON SPUTTERING; MAGNETRONS; PHOTOELECTRONS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 84892903643     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201330216     Document Type: Article

References (39)

1. L. Leontie, M. Caraman, M. Delibas, and, G. I. Rusu, Mater. Res. Bull. 36, 1629-1637 (2009).
2. H. A. Harwig, and, A. G. Gerards, J. Solid State Chem. 26, 265-274 (1978).
3. P. Shuk, H. D. Wiemhöfer, U. Guth, W. Göpel, and, M. Greenblatt, Solid State Ion. 89, 179-196 (1996).
4. N. Cornei, N. Tancret, F. Abraham, and, O. Mentre, Inorg. Chem. 45, 4886-4888 (2006).
5. S. Condurache-Bota, and, G. Rusu, Rev. Roumaine Chim. 54, 205-211 (2009).
6. N. M. Sammes, G. A. Tompsett, H. Näfe, and, F. Aldinger, J. Electrochem. Soc. 19, 1801-1826 (1998).
7. H. T. Fan, S. S. Pan, X. M. Teng, C. Ye, G. H. Li, and, L. D. Zhang, Thin Solid Films 513, 142-147 (2006).
8. L. Leontie, M. Caraman, I. Evtodiev, E. Cuculescu, and, A. Mija, Phys. Status Solidi A 205, 2052-2056 (2008).
9. P. B. Clapham, Br. J. Appl. Phys. 363, 363-366 (1967).
10. S. Condurache-Bota, N. Tigau, A. P. Rambu, G. G. Rusu, and, G. I. Rusu, Appl. Surf. Sci. 257, 10545-10550 (2011).
11. R. B. Patil, J. B. Yadav, R. K. Puri, and, V. Puri, J. Phys. Chem. Solids 68, 665-669 (2007).
12. G. Lin, D. Tan, F. Luo, D. Chen, Q. Zhao, J. Qiu, and, Z. Xu, J. Alloys Compd. 507, L43-L46 (2010).
13. Y. D. Shen, Y. W. Li, W. M. Li, J. Z. Zhang, Z. G. Hu, and, J. H. Chu, J. Phys. Chem. C 116, 3449-3456 (2012).
14. R. H. Misho, W. A. Murad, and, Z. A. R. Salmin, Sol. Energy Mater. 21, 347-358 (1991).
15. T. N. Soitah, and, C. Yang, Curr. Appl. Phys. 10, 724-728 (2010).
16. S. Li, J. Morasch, A. Klein, C. Chirila, L. Pintilie, J. Lichao, K. Ellmer, M. Naderer, K. Reichmann, M. Gröting, and, K. Albe, Phys. Rev. B 88, 045428 (2013).
17. A. Walsh, G. Watson, D. Payne, R. Edgell, J. Guo, P. Glans, T. Learmonth, and, K. Smith, Phys. Rev. B 73, 235104 (2006).
18. S. H. Hsieh, G. J. Lee, C. Y. Chen, J. H. Chen, S. H. Ma, T. L. Horng, K. H. Chen, and, J. J. Wu, J. Nanosci. Nanotechnol. 12, 5930-5936 (2012).
19. S. Condurache-Bota, G. I. Rusu, N. Tigau, and, L. Leontie, Cryst. Res. Technol. 45, 503-511 (2010).
20. T. Minami, Y. Nishi, T. Miyata, and, Ji. Nomoto, Appl. Phys. Express 4, 062301 (2011).
21. T. Minami, Y. Nishi, and, T. Miyata, Appl. Phys. Express 6, 044101 (2013).
22. A. Klein, C. Körber, A. Wachau, F. Säuberlich, Y. Gassenbauer, S. P. Harvey, D. E. Proffit, and, T. O. Mason, Materials 3, 4892-4914 (2010).
23. F. Chen, R. Schafranek, W. Wu, and, A. Klein, J. Phys. D 44, 255301 (2011).
24. A. Klein, J. Am. Ceram. Soc. 96, 331-345 (2013).
25. T. R. Debies, and, J. W. Rabalais, Chem. Phys. 20, 277-283 (1977).
26. J. F. Moulder, W. F. Stickle, P. E. Sobol, and, K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Physical Electronics, Inc., Eden Prairie, 1995).
27. M. Valant, and, D. Suvorov, J. Am. Ceram. Soc. 87, 1056-1061 (2004).
28. S. W. Kang, and, S. W. Rhee, Thin Solid Films 468, 79-83 (2004).
29. J. R. Waldrop, E. A. Kraut, S. P. Kowalczyk, and, R. W. Grant, Surf. Sci. 132, 513-518 (1983).
30. C. Körber, V. Krishnakumar, A. Klein, G. Panaccione, P. Torelli, A. Walsh, J. L. F. D. Silva, S. H. Wei, R. G. Egdell, and, D. J. Payne, Phys. Rev. B 81, 165207 (2010).
31. M. Alonso, R. Cimino, and, K. Horn, Phys. Rev. Lett. 64, 1947 (1990).
32. R. Schafranek, S. Payan, M. Maglione, and, A. Klein, Phys. Rev. B 77, 195310 (2008).
33. R. Schafranek, S. Li, F. Chen, W. Wu, and, A. Klein, Phys. Rev. B 84, 045317 (2011).
34. A. Klein, Thin Solid Films 520, 3721-3728 (2012).
35. F. Chen, R. Schafranek, S. Li, W. B. Wu, and, A. Klein, J. Phys. D 43, 295301 (2010).
36. A. Bourlange, D. J. Payne, R. G. Egdell, J. S. Foord, P. P. Edwards, M. O. Jones, A. Schertel, P. J. Dobson, and, J. L. Hutchison, Appl. Phys. Lett. 92, 092117 (2008).
37. A. Walsh, J. Da Silva, S. Wei, C. Körber, A. Klein, L. Piper, A. DeMasi, K. Smith, G. Panaccione, P. Torelli, D. Payne, A. Bourlange, and, R. Egdell, Phys. Rev. Lett. 100, 167402 (2008).
38. Y. Gassenbauer, and, A. Klein, Solid State Ion 173, 141-145 (2004).
39. J. Gassmann, J. Brötz, and, A. Klein, Appl. Surf. Sci. 258, 3913-3919 (2012).