Optical properties of bismuth oxide thin films prepared by reactive d.c. magnetron sputtering onto p-GaSe (Cu)

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 8, 2008, Pages 2052-2056

  Leontie, Liviu ^a   Caraman, M ^b   Evtodiev, Igor ^c   Cuculescu, Elmira ^c   Mija, Ana ^c  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b VASILE ALECSANDRI UNIVERSITY OF BACAU   (Romania)

^c MOLDOVA STATE UNIVERSITY   (Moldova)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH OXIDE THIN FILMS; BISMUTH OXIDES; DENSITY OF LOCALIZED STATES; INTERACTION MECHANISMS; JUNCTION INTERFACES; NANOMETRIC; OPTICAL ABSORPTIONS; OUTER SURFACES; REACTIVE MAGNETRON SPUTTERING; SAMPLE THICKNESSES; SEMICONDUCTING OXIDE FILMS; SPECTRAL CHARACTERISTICS; VALENCE BONDS; WAVELENGTH RANGES;

ABSORPTION; BISMUTH; COPPER; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL CONSTANTS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SEMICONDUCTING INDIUM; THICK FILMS; THIN FILMS;

OXIDE FILMS;

EID: 54249121311     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200778868     Document Type: Conference Paper

References (14)

1. L. Leontie, M. Caraman, and G. I. Rusu, J. Optoelectron. Adv. Mater. 2, 385 (2000).
2. L. Leontie, M. Caraman, A. Visinoiu, and G. I. Rusu, Thin Solid Films 473, 230 (2005).
3. L. Leontie, J. Optoelectron. Adv. Mater. 8, 1221 (2006).
4. V. Fruth, M. Popa, D. Berger, R. Ramer, M. Gartner, A. Ciulei, and M. Zaharescu, J. Eur. Ceram. Soc. 25, 2171 (2005).
5. G. Bandoli, D. Barecca, E. Brescacin, G. A. Rizzi, and E. Tondello, Chem. Vapor Depos. 2, 238 (1996).
6. E. Cuculescu, Ig. Evtodiev, M. Caraman, and L. Leontie, J. Optoelectron. Adv. Mater. 8, 112 (2006).
7. G. Korotcencov, Sens. Actuators B 107, 209 (2005).
8. H. Hosono, Thin Solid Films 515, 6000 (2007).
9. Ph. Schmid, J. P. Voitchovsky, and A. Mercier, phys. stat. sol. (a) 21, 443 (1974).
10. Yu, I. Uchanov, Optičeskie Svoistva Poluprovodnikov (Nauka, Moskva, 1977), p. 75.
11. R. W. Ditchburn, Light (Blackie & Son Ltd., London, Glasgow, 1965).
12. H. R. Phillip and H. Ehrenreich, Semicond. Semimet. 3, 93 (1967).
13. B. E. Warren, X-ray Diffraction (Dover, New York, 1990), p. 253.
14. Y. Marfaing, in: Handbook on Semiconductors, Optical Properties of Semiconductors, edited by T. S. Moss and M. Balkanski (North-Holland, Elsevier, Amsterdam, 1994), p. 758.