Reduction-induced Fermi level pinning at the interfaces between Pb(Zr,Ti)O3 and Pt, Cu and Ag metal electrodes

Journal of Physics D: Applied Physics

Volumn 44, Issue 25, 2011, Pages

  Chen, Feng ^a   Schafranek, Robert ^a   Wu, Wenbin ^b   Klein, Andreas ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER HEIGHTS; CHEMICAL REDUCTION; FERMI LEVEL PINNING; IN-SITU; INTERFACE FORMATION; INTERFACE REACTIONS; METAL DEPOSITION; METAL ELECTRODES; OXYGEN DEFICIENT; PB(ZR , TI)O; SUBSTRATE SURFACE;

FERMI LEVEL; PHOTOELECTRON SPECTROSCOPY; PLATINUM; SILVER; ZIRCONIUM;

LEAD;

EID: 79958852673     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/25/255301     Document Type: Article

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