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Volumn 552, Issue , 2014, Pages 155-158
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Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
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Author keywords
Aluminum oxide; Atomic layer deposition; Titanium dioxide; Water vapor transmission rate
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Indexed keywords
ALUMINUM OXIDES;
MULTI-LAYER THIN FILM;
ORGANIC LIGHT EMITTING DIODES(OLEDS);
PASSIVATION PROPERTIES;
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION;
SUBSTRATE TEMPERATURE;
WATER VAPOR BARRIERS;
WATER VAPOR TRANSMISSION RATE;
ALUMINUM;
ATOMIC LAYER DEPOSITION;
BUILDING MATERIALS;
DEPOSITION;
MULTILAYER FILMS;
ORGANIC LIGHT EMITTING DIODES (OLED);
OXIDES;
PASSIVATION;
REFRACTIVE INDEX;
SUBSTRATES;
WATER VAPOR;
TITANIUM DIOXIDE;
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EID: 84892791617
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2013.12.003 Document Type: Article |
Times cited : (35)
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References (20)
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