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Volumn 552, Issue , 2014, Pages 155-158

Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation

Author keywords

Aluminum oxide; Atomic layer deposition; Titanium dioxide; Water vapor transmission rate

Indexed keywords

ALUMINUM OXIDES; MULTI-LAYER THIN FILM; ORGANIC LIGHT EMITTING DIODES(OLEDS); PASSIVATION PROPERTIES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SUBSTRATE TEMPERATURE; WATER VAPOR BARRIERS; WATER VAPOR TRANSMISSION RATE;

EID: 84892791617     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.12.003     Document Type: Article
Times cited : (35)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.