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Volumn 8, Issue 9, 2008, Pages 4726-4729
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Titanium dioxide thin films deposited by plasma enhanced atomic layer deposition for OLED passivation
a a a a a a a a |
Author keywords
Organic Light Emitting Diode (OLED); Passivation film; Plasma Enhanced Atomic Layer Deposition (PEALD); Titanium dioxide; Water Vapor Transmission Rate (WVTR)
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Indexed keywords
ATOMIC LAYERS;
DEPOSITION TEMPERATURES;
LIFE-TIMES;
LIGHT EMITTING DIODE LEDS;
ORGANIC LIGHT-EMITTING DIODE (OLED);
OXYGEN PLASMAS;
PASSIVATION FILM;
PASSIVATION PROPERTIES;
PLASMA POWERS;
TETRAKIS;
TITANIUM DIOXIDE FILMS;
TITANIUM DIOXIDE THIN FILMS;
WATER VAPOR TRANSMISSION RATE (WVTR);
WATER VAPOR TRANSMISSION RATES;
ATOMIC PHYSICS;
ATOMS;
DEPOSITION;
FILM GROWTH;
HELMET MOUNTED DISPLAYS;
LIGHT EMISSION;
LIGHT EMITTING DIODES;
ORGANIC LIGHT EMITTING DIODES (OLED);
OXIDES;
OXYGEN;
PASSIVATION;
PLASMA DEPOSITION;
PLASMA DIAGNOSTICS;
PLASMAS;
PULSED LASER DEPOSITION;
THICK FILMS;
THIN FILMS;
TITANIUM;
TITANIUM DIOXIDE;
VAPOR DEPOSITION;
VAPORS;
WATER VAPOR;
ATOMIC LAYER DEPOSITION;
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EID: 55849136902
PISSN: 15334880
EISSN: None
Source Type: Journal
DOI: 10.1166/jnn.2008.IC48 Document Type: Conference Paper |
Times cited : (27)
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References (13)
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