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Volumn 8, Issue 9, 2008, Pages 4726-4729

Titanium dioxide thin films deposited by plasma enhanced atomic layer deposition for OLED passivation

Author keywords

Organic Light Emitting Diode (OLED); Passivation film; Plasma Enhanced Atomic Layer Deposition (PEALD); Titanium dioxide; Water Vapor Transmission Rate (WVTR)

Indexed keywords

ATOMIC LAYERS; DEPOSITION TEMPERATURES; LIFE-TIMES; LIGHT EMITTING DIODE LEDS; ORGANIC LIGHT-EMITTING DIODE (OLED); OXYGEN PLASMAS; PASSIVATION FILM; PASSIVATION PROPERTIES; PLASMA POWERS; TETRAKIS; TITANIUM DIOXIDE FILMS; TITANIUM DIOXIDE THIN FILMS; WATER VAPOR TRANSMISSION RATE (WVTR); WATER VAPOR TRANSMISSION RATES;

EID: 55849136902     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.IC48     Document Type: Conference Paper
Times cited : (27)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.