Atomic layer deposition of bismuth oxide using Bi(OCMe2 iPr)3 and H2O

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 1, 2014, Pages

  Austin, Dustin Z ^a,b   Allman, Derryl ^b   Price, David ^b   Hose, Sallie ^b   Saly, Mark ^c,d   Conley Jr , John F ^a  

^a Oregon State University   (United States)

^b ON SEMICONDUCTOR   (United States)

^c SAFC Hitech   (United Kingdom)

^d APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH OXIDE THIN FILMS; BISMUTH OXIDES; DEPOSITION TEMPERATURES; INTERFACIAL ROUGHNESS; POST-DEPOSITION; RUTHERFORD BACK-SCATTERING SPECTROMETRY; VOLUMETRIC EXPANSION; X RAY REFLECTIVITY;

ATOMIC LAYER DEPOSITION; BISMUTH; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

DEPOSITION;

EID: 84891756303     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4840835     Document Type: Article

References (38)

1. V. Dolocan and F. Iova, Phys. Status Solidi A 64, 755 (1981). 10.1002/pssa.2210640242
2. L. Leontie, M. Caraman, A. Visinoiu, and G. I. Rusu, Thin Solid Films 473, 230 (2005). 10.1016/j.tsf.2004.07.061
3. V. Dimitrov and S. Sakka, J. Appl. Phys. 79, 1736 (1996). 10.1063/1.360962
4. H. Frederikse, CRC Handbook of Chemistry and Physics (CRC, Boca Raton, 2003).
5. S. Condurache-Bota, N. Tigau, A. P. Rambu, G. G. Rusu, and G. I. Rusu, Appl. Surf. Sci. 257, 10545 (2011). 10.1016/j.apsusc.2011.07.048
6. D. Shan, J. Zhang, H.-G. Xue, Y.-C. Zhang, S. Cosnier, and S.-N. Ding, Biosens. Bioelectron. 24, 3671 (2009). 10.1016/j.bios.2009.05.038
7. B. Sirota, J. Reyes-Cuellar, P. Kohli, L. Wang, M. E. McCarroll, and S. M. Aouadi, Thin Solid Films 520, 6118 (2012). 10.1016/j.tsf.2012.06.001
8. K. Kobayashi, J. Non-Cryst. Solids 316, 403 (2003). 10.1016/S0022- 3093(02)01907-5
9. H. Weidong, Q. Wei, W. Xiaohong, D. Xianbo, C. Long, and J. Zhaohua, Thin Solid Films 515, 5362 (2007). 10.1016/j.tsf.2007.01.031 (Pubitemid 46507564)
10. K. L. Chopra and S. R. Das, Thin Film Solar Cells (Plenum, New York, 1983).
11. T. P. Gujar, V. R. Shinde, C. D. Lokhande, and S.-H. Han, Mater. Sci. Eng. B 133, 177 (2006). 10.1016/j.mseb.2006.06.025 (Pubitemid 44308401)
12. X. Gou, R. Li, G. Wang, Z. Chen, and D. Wexler, Nanotechnology 20, 495501 (2009). 10.1088/0957-4484/20/49/495501
13. W. H. Dumbaugh and J. C. Lapp, J. Am. Ceram. Soc. 75, 2315 (1992). 10.1111/j.1151-2916.1992.tb05581.x
14. Y. Zeng and Y. S. Lin, J. Catal. 182, 30 (1999). 10.1006/jcat.1998.2313
15. D. Barreca, G. A. Rizzi, and E. Tondello, Thin Solid Films 333, 35 (1998). 10.1016/S0040-6090(98)00800-1
16. E. M. Dianov, J. Lightware Technol. 31, 681 (2013). 10.1109/JLT.2012. 2211569
17. C. D. Ling, R. L. Withers, S. Schmid, and J. G. Thompson, J. Solid State Chem. 137, 42 (1998). 10.1006/jssc.1997.7677 (Pubitemid 128349283)
18. K.-H. Cho, C.-H. Choi, Y. H. Jeong, S. Nahm, C.-Y. Kang, S.-J. Yoon, and H.-J. Lee, J. Electrochem. Soc. 155, G148 (2008). 10.1149/1.2936260
19. B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee, and W. Jo, Nature 401, 682 (1999). 10.1038/44352 (Pubitemid 29485209)
20. M. Vehkamäki, T. Hatanpää, M. Kemell, M. Ritala, and M. Leskelä, Chem. Mater. 18, 3883 (2006). 10.1021/cm060966v (Pubitemid 44318574)
21. M. Karimi, R. Tu, J. Peng, W. Lennard, G. H. Chapman, and K. L. Kavanagh, Thin Solid Films 515, 3760 (2007). 10.1016/j.tsf.2006.09.040 (Pubitemid 46240149)
22. Y. D. Shen, Y. W. Li, W. M. Li, J. Z. Zhang, Z. G. Hu, and J. H. Chu, J. Phys. Chem. C 116, 3449 (2012). 10.1021/jp205180p
23. M. Vehkamäki, T. Hatanpää, M. Ritala, and M. Leskelä, J. Mater. Chem. 14, 3191 (2004). 10.1039/b405891g
24. S. J. A. Moniz, C. S. Blackman, C. J. Carmalt, and G. Hyett, J. Mater. Chem. 20, 7881 (2010). 10.1039/c0jm01720e
25. M. Mehring, Coord. Chem. Rev. 251, 974 (2007). 10.1016/j.ccr.2006.06.005
26. S. W. Kang and S. W. Rhee, Thin Solid Films 468, 79 (2004). 10.1016/j.tsf.2004.04.021
27. G. Bandoli, D. Barreca, E. Brescacin, G. A. Rizzi, and E. Tondello, Chem. Vap. Deposition 2, 238 (1996). 10.1002/cvde.19960020605
28. M. Putkonen and L. Niinistö, Precursor Chemistry of Advanced Materials (Springer-Verlag, Berlin, 2005), Vol. 9, pp. 125-145.
29. T. Hatanpää, M. Vehkamäki, M. Ritala, and M. Leskelä, Dalton Trans. 39, 3219 (2010). 10.1039/b918175j
30. P. Shuk, H.-D. Wiemhöfer, U. Guth, W. Göpel, and M. Greenblatt, Solid State Ionics 89, 179 (1996). 10.1016/0167-2738(96)00348-7
31. M. Yashima, D. Ishimura, and K. Ohoyama, J. Am. Ceram. Soc. 88, 2332 (2005). 10.1111/j.1551-2916.2005.00432.x (Pubitemid 41568227)
32. H. A. Harwig and A. G. Gerards, J. Solid State Chem. 26, 265 (1978). 10.1016/0022-4596(78)90161-5 (Pubitemid 9406384)
33. E. Oniyama and P. G. Wahlbeck, J. Phys. Chem. B 102, 4418 (1998). 10.1021/jp980166a
34. D. Risold, B. Hallstedt, L. J. Gauckler, H. L. Lukas, and S. G. Fries, J. Phase Equilib. 16, 223 (1995). 10.1007/BF02667306
35. R. B. Patil, R. K. Puri, and V. Puri, Arch. Phys. Res. 2, 31 (2011).
36. R. L. Puurunen and W. Vandervorst, J. Appl. Phys. 96, 7686 (2004). 10.1063/1.1810193 (Pubitemid 40044470)
37. Y. Hishikawa, N. Nakamura, S. Tsuda, S. Nakano, Y. Kishi, and Y. Kuwano, Jpn. J. Appl. Phys., Part 1 30, 1008 (1991). 10.1143/JJAP.30.1008
38. S. Adachi, Optical Properties of Crystalline and Amorphous Semiconductors: Materials and Fundamental Principles, 1st ed. (Kluwer Academic, Boston, 1999).