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Journal of Materials Chemistry

Volumn 20, Issue 36, 2010, Pages 7881-7886

MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

(4) Moniz, Savio J A a Blackman, Christopher S a Carmalt, Claire J a Hyett, Geoffrey a

a UNIVERSITY COLLEGE LONDON (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALKOXIDE PRECURSOR; BAND GAPS; BISMUTH OXIDES; CHEMICAL VAPOUR DEPOSITION; GLASS SUBSTRATES; MOCVD; SINGLE-SOURCE PRECURSOR; UV IRRADIATION;

BISMUTH; CHEMICAL VAPOR DEPOSITION; DEPOSITION; PHOTODEGRADATION; SUBSTRATES; THIN FILMS;

OXIDE FILMS;

EID: 78149444464 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c0jm01720e Document Type: Article

Times cited : (60)

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