A force-decoupled compound parallel alignment stage for nanoimprint lithography

Review of Scientific Instruments

Volumn 84, Issue 12, 2013, Pages

  Sun, Xiantao ^a   Chen, Weihai ^a   Zhou, Rui ^a   Chen, Wenjie ^b   Zhang, Jianbin ^a  

^a BEIHANG UNIVERSITY   (China)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT ACCURACY; CRITICAL COMPONENT; FLEXURE-BASED MECHANISM; MULTI DEGREE-OF-FREEDOM; PARALLEL ALIGNMENTS; SPHERICAL AIR BEARINGS; STAGE PERFORMANCE; THEORETICAL MODELING;

BEARINGS (MACHINE PARTS); NANOIMPRINT LITHOGRAPHY;

ALIGNMENT;

EID: 84891675838     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.4838595     Document Type: Conference Paper

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