Design and analysis of the single-step nanoimprinting lithography equipment for sub-100 nm linewidth

Current Applied Physics

Volumn 6, Issue 6 SPEC. ISS., 2006, Pages 1007-1011

  Lee, JaeJong ^a   Choi, Kee Bong ^a   Kim, Gee Hong ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

Compliant flexure stage; Nanoimprinting lithography; Overlay and alignment

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; NANOSTRUCTURED MATERIALS; PATTERN RECOGNITION; PHOTORESISTORS; SUBSTRATES; WSI CIRCUITS;

COMPLIANT FLEXURE STAGE; DOF COMPLIANT MECHANISM; NANOIMPRINTING LITHOGRAPHY; OVERLAY AND ALIGNMENT;

LITHOGRAPHY;

EID: 33746319908     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2005.07.007     Document Type: Article

References (4)

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2. Choi B.J., Sreenivasan S.V., Johnson S., Colburn M., and Wilson C.G. Design of orientation stage for step and flash imprint lithography. Precision Engineering 25 (2001) 192-199
3. Choi K.-B. Kinematic analysis and optimal design of 3-PPR planar parallel manipulator. KSME International Journal 17 4 (2003) 528-537
4. Alkaisi M.M., et al. Multilevel nanoimprint lithography. Current Applied Physics 4 (2004)