Monolithic design of a compliant template orientation stage for step imprint lithography

Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture

Volumn 226, Issue 2, 2012, Pages 221-228

  Shao, J Y ^a,b   Ding, Y C ^a   Liu, H Z ^a   Li, X M ^a   Tian, H M ^a   Xiao, B H ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

flexible hinges; imprint lithography; overlay; position shift; template orientation stage

Indexed keywords

ACTIVE CONTROL; CONNECTING LINES; FINITE ELEMENT ANALYSIS METHOD; FLEXIBLE HINGES; FOUR-BAR LINKAGE; FOUR-GROUP; IMPRINT LITHOGRAPHY; IMPRINTING PROCESS; LATERAL MOTION; MONOLITHIC DESIGN; OVERLAY; PATTERN FIDELITY; POSITION SHIFT; ROTATION AXIS; SURFACE CONTACT; WAFER STAGE;

FINITE ELEMENT METHOD; HINGES; MECHANISMS; NANOIMPRINT LITHOGRAPHY;

COMPLIANT MECHANISMS;

EID: 84860259457     PISSN: 09544054     EISSN: 20412975     Source Type: Journal    
DOI: 10.1177/0954405411418752     Document Type: Article

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