Tunneling electroresistance induced by interfacial phase transitions in ultrathin oxide heterostructures

Nano Letters

Volumn 13, Issue 12, 2013, Pages 5837-5843

  Jiang, Lu ^a,b   Choi, Woo Seok ^a   Jeen, Hyoungjeen ^a   Dong, Shuai ^a,b,c   Kim, Yunseok ^a   Han, Myung Geun ^d   Zhu, Yimei ^d   Kalinin, Sergei V ^a   Dagotto, Elbio ^a,b   Egami, Takeshi ^a,b,e   Lee, Ho Nyung ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

^c SOUTHEAST UNIVERSITY   (China)

^d BROOKHAVEN NATIONAL LABORATORY   (United States)

^e University of Tennessee   (United States)

Author keywords

correlated electron oxides; interfacial phase transition; Nanoscale ferroelectric junctions; pulsed laser epitaxy; tunneling electroresistance

Indexed keywords

CORRELATED ELECTRONS; INTERFACIAL PHASE; NANO SCALE; PULSED LASER EPITAXIES; TUNNELING ELECTRORESISTANCE;

ELECTROSTATICS; FERROELECTRICITY; PHASE MODULATION; POLARIZATION;

ELECTRIC RESISTANCE;

IRON; NANOMATERIAL; OXIDE;

ARTICLE; CHEMISTRY; ELECTRIC CONDUCTIVITY; ELECTRON; PHASE TRANSITION;

ELECTRIC CONDUCTIVITY; ELECTRONS; IRON; NANOSTRUCTURES; OXIDES; PHASE TRANSITION;

EID: 84890374635     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl4025598     Document Type: Article

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