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Volumn , Issue , 2005, Pages 246-265

Theoretical methods for modeling chemical processes on semiconductor surfaces

Author keywords

[No Author keywords available]

Indexed keywords


EID: 84889987364     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1007/1-4020-2117-8_6     Document Type: Chapter
Times cited : (3)

References (108)
  • 50
    • 84889971660 scopus 로고    scopus 로고
    • available at
    • The program Dacapo is available at http://www.fysik.dtu.dk/CAMPOS.
    • The program Dacapo is
  • 68
    • 0038626673 scopus 로고    scopus 로고
    • Revision A.1
    • Gaussian 03, Revision A.1
    • Gaussian 03
  • 87
    • 84889986235 scopus 로고    scopus 로고
    • J. A. Steckel and K. D. Jordon, unpublished results.
    • J. A. Steckel and K. D. Jordon, unpublished results.
  • 101
    • 84889964876 scopus 로고    scopus 로고
    • The Transiesta code is described at
    • The Transiesta code is described at www.transiesta.com.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.