New approaches to the computer simulation of amorphous alloys: A review

Materials

Volumn 4, Issue 4, 2010, Pages 716-781

  Valladares, Ariel A ^a   Díaz Celaya, Juan A ^a   Galván Colín, Jonathan ^a   Mejía Mendoza, Luis M ^b   Reyes Retana, José A ^a   Valladares, Renela M ^b   Valladares, Alexander ^b   Alvarez Ramirez, Fernando ^c   Qu, Dongdong ^d   Shen, Jun ^d  

^a INSTITUTO DE INVESTIGACIONES EN MATERIALES   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c INSTITUTO MEXICANO DEL PETRÓLEO   (Mexico)

^d HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Amorphous alloys; Bulk metallic glasses; Computational simulations; Electronic structure; Vibrational densities of states

Indexed keywords

ALUMINUM ALLOYS; ALUMINUM NITRIDE; AMORPHOUS ALLOYS; AMORPHOUS SILICON; BINARY ALLOYS; COPPER ALLOYS; DISTRIBUTION FUNCTIONS; III-V SEMICONDUCTORS; METALLIC GLASS; OPTICAL PROPERTIES; SILICON ALLOYS; SILICON CARBIDE; SILICON NITRIDE; TOPOLOGY;

AB INITIO APPROACH; ATOMIC TOPOLOGY; BINARY SYSTEMS; BULK METALLIC GLASS; COMPUTATIONAL SIMULATION; ELECTRONIC.STRUCTURE; GROUP-IV; NEW APPROACHES; TIME STEP; VIBRATIONAL DENSITY OF STATE;

ELECTRONIC STRUCTURE;

EID: 84889577263     PISSN: None     EISSN: 19961944     Source Type: Journal    
DOI: 10.3390/ma4040716     Document Type: Article

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