Industrial high-rate (∼14 nm/s) deposition of low resistive and transparent ZnOx:Al films on glass

Solar Energy Materials and Solar Cells

Volumn 95, Issue 7, 2011, Pages 1955-1959

  Illiberi, A ^a   Kniknie, B ^a   Van Deelen, J ^a   Steijvers, H L A H ^a   Habets, D ^a   Simons, P J P M ^a   Janssen, A C ^a   Beckers, E H A ^a  

^a TNO   (Netherlands)

Author keywords

Aluminum doped zinc oxide; Atmospheric pressure chemical vapor deposition; Deposition rate; Thin film solar cells; Transparent conductive oxide

Indexed keywords

A-SI:H; AL FILMS; ALUMINUM-DOPED ZINC OXIDE; ALUMINUM-DOPED ZNO; ATOMIC FORCE MICROSCOPES; CRYSTALLINE QUALITY; CRYSTALLINITIES; CVD PROCESS; DEPOSITED FILMS; DIETHYLZINC; ELECTRICAL AND OPTICAL PROPERTIES; FOUR POINT PROBE; HIGH DEPOSITION RATES; HIGH RATE; HIGH THROUGHPUT; IN-LINE; INITIAL EFFICIENCY; METALORGANIC CHEMICAL VAPOR DEPOSITION; PREFERENTIAL ORIENTATION; THIN FILM SOLAR CELLS; TRANSPARENT CONDUCTIVE OXIDES; TRIMETHYLALUMINIUM; VISIBLE RANGE; ZNO;

ALUMINUM; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; DEPOSITION RATES; DOPING (ADDITIVES); ELECTRIC PROPERTIES; GLASS; INDUSTRY; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SOLAR CELLS; THIN FILMS; VAPOR DEPOSITION; VAPORS; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

ALUMINUM COATINGS;

EID: 79955479521     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2011.01.007     Document Type: Article

References (28)

1. C.G. Granqvist Transparent conductors as solar energy materials: a panoramic review Solar Energy Materials and Solar Cells 91 2007 1529 1598 (Pubitemid 47259358)
2. C.F. Klinshirn, B.K. Meyer, A. Wang, A. Hoffmann, J. Geurts, Zinc Oxide: From Fundamental Properties Towards Novel Applications, Springer Series in Materials Science, vol. 120, 2010.
3. R. Groenen, J. Loffler, P.M. Sommeling, J.L. Linden, E.A.G. Harmes, R.E.I. Schropp, and M.C.M. van de Sanden Surface textured ZnO films for thin film solar cell applications by expanding thermal plasma CVD Thin Solid Films 392 2001 226 230 (Pubitemid 32618191)
4. L. Raniero, I. Ferreira, A. Pimentel, A. Goncalves, P. Canhola, E. Fortunato, and R. Martins Role of hydrogen plasma on electrical and optical properties of ZGO, ITO and IZO transparent and conductive coatings Thin Solid Films 511 2006 295 298 (Pubitemid 44255781)
5. A. Illiberi, K. Sharma, M. Creatore, and M.C.M. van de Sanden Novel approach to thin film polycrystalline silicon on glass Materials Letters 63 2009 1817 1819
6. R. Banerjee, S. Ray, N. Basu, A.K. Batabyal, and A.K. Barua Degradation of tin-doped indium-oxide film in hydrogen and argon plasma Journal of Applied Physics 62 1987 912 916
7. T. Minami Present status of transparent conductive oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes Thin Solid Films 516 2008 5822 5828
8. H. Liang, and R.G. Gordon Atmospheric pressure chemical vapour deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells Journal of Materials Science 42 2007 6388 6399 (Pubitemid 47141996)
9. W.W. Wenas, A. Yamada, K. Takahashi, M. Yoshino, and M. Konagai Electrical and optical properties of boron-doped ZnO thin films for solar cells grown by metalorganic chemical vapour deposition Journal of Applied Physics 70 1991 7119 7123
10. P. Nunes, E. Fortunato, P. Tonello, F.B. Fernandes, P. Vilarinho, and R. Martins Effect of different dopant elements on the properties of ZnO thin films Vacuum 64 2002 281 285 (Pubitemid 34011675)
11. J. Hu, and Roy G. Gordon Atmospheric pressure chemical vapour deposition of gallium doped zinc oxide thin films from diethyl zinc, water, and triethyl gallium Journal of Applied Physics 72 1992 5381 5392
12. I. Kim, K.S. Lee, T.S. Lee, J.H. Jeong, B.K. Cheong, Y.J. Baik, and W.M. Kim Effect of fluorine addition on transparent and conducting Al doped ZnO films Journal of Applied Physics 100 2006 063701
13. S. Fay, J. Steinhauser, S. Nicolay, and C. Ballif Polycrystalline ZnO:B grown by LPCVD as TCO for thin film silicon solar cells Thin Solid Films 518 2010 2961 2966
14. J. Hu, and R.G. Gordon Textured aluminium-doped zinc oxide thin films from atmospheric pressure chemical-vapor deposition Journal of Applied Physics 71 1992 880 891
15. I. Volintiru, M. Creatore, B.J. Kniknie, C.I.M.A. Spee, and M.C.M. van de Sanden Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapour deposition Journal of Applied Physics 102 2007 043709 0437017
16. V. Sittinger, F. Ruske, W. Werner, B. Szyszka, B. Rech, J. Hupkes, G. Schope, and H. Stiebig ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells Thin Solid Films 496 2006 16 25 (Pubitemid 41689858)
17. K. Matsubara, P. Fons, K. Iwata, A. Yamada, K. Sakurai, H. Tampo, and S. Niki ZnO transparent conductive films deposited by pulsed laser deposition for solar cell applications Thin Solid Films 431 2003 369 372
18. S. Major, A. Banerjee, and K.L. Chopra Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysis Thin Solid Films 108 1983 333 340 (Pubitemid 14580251)
19. M.W. Zhu, J. Gong, C. Sun, J.H. Xia, and X. Jiang Investigation of correlation between the microstructure and electrical properties of solgel derived ZnO based thin films Journal of Applied Physics 104 2008 073113 073119
20. J. Hu, and R.G. Gordon Textured aluminum-doped zinc oxide thin films from atmospheric pressure chemical-vapor deposition Journal of Applied Physics 71 1992 880 890
21. F.T.J. Smith Metalorganic chemical vapour deposition of oriented ZnO films over large areas Applied Physics Letters 43 1983 1108 1110
22. C. Thiandoume, V. Sallet, R. Triboulet, and O. Gorochov Decomposition kinetics of tertiarybutanol and dyethylzinc used as precursor sources for the growth of ZnO Journal of Crystal Growth 311 2009 1411 1415
23. M. Birkholz, B. Selle, F. Fenske, and W. Fush Structure-function relationship between preferred orientation of crystallites and electrical resistivity in thin polycrystalline ZnO:Al films Physical Review B 68 2003 205414 205421
24. H. Hirasawa, M. Yoshida, S. Nakamura, Y. Suzuki, S. Okada, and K. Kondo ZnO:Ga conducting-films grown by DC arc-discharge ionplating Solar Energy Materials and Solar Cells 67 2001 231 236 (Pubitemid 32092029)
25. R.J. Hong, X. Jiang, B. Szyszka, V. Sittinger, S.H. Xu, W. Werner, and G. Heide Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive and mid-frequency magnetron sputtering Journal of Crystal Growth 253 2003 117 128
26. C. Suryanarayana, and M. Grant Norton X-ray diffraction - A practical approach 1998 Plenum Press New York and London
27. Y. Shigesato, Y. Hayashi, and T. Haranoh Doping mechanism of tin-doped indium oxide films Applied Physics Letters 61 1992 73 75
28. K. Ellmer Resistivity of polycrystalline zinc oxide films: current status and physical limit Journal of Physics D: Applied Physics 34 2001 3097 3108 (Pubitemid 33120726)