Releasing high aspect ratio SU-8 microstructures using AZ photoresist as a sacrificial layer on metallized Si substrates

Microsystem Technologies

Volumn 19, Issue 11, 2013, Pages 1863-1871

  Lau, Kia Hian ^a   Giridhar, Archit ^a   Harikrishnan, Sekar ^a   Satyanarayana, Nalam ^a   Sinha, Sujeet K ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH ASPECT RATIO; METALLIC THIN LAYERS; MONOMETHYL ETHERS; PROPYLENE GLYCOLS; SACRIFICIAL LAYER; SI SUBSTRATES; SU-8 MICROSTRUCTURES; SU-8 STRUCTURE;

ALUMINUM COATINGS; ASPECT RATIO; PHOTORESISTS; SILICON;

SUBSTRATES;

EID: 84887234860     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-013-1740-0     Document Type: Conference Paper

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