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Volumn 70, Issue 1-2, 1998, Pages 42-47

Fabrication process of high aspect ratio elastic and SU-8 structures for piezoelectric motor applications

Author keywords

Aspect ratio; Photoresist; Piezoelectric motor; SU 8

Indexed keywords


EID: 0001817862     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00110-1     Document Type: Article
Times cited : (55)

References (9)
  • 1
    • 0027146802 scopus 로고
    • Hybrid ultrasonic micromachined motors
    • Fort Lauderdale, USA, 7-10 February
    • G.-A. Racine, R. Luthier, N.F. de Rooij, Hybrid ultrasonic micromachined motors, MEMS '93, Fort Lauderdale, USA, 7-10 February 1993, pp. 128-132.
    • (1993) MEMS '93 , pp. 128-132
    • Racine, G.-A.1    Luthier, R.2    De Rooij, N.F.3
  • 2
    • 0027928104 scopus 로고
    • Microfabrication of 3D multidirectional inclined structures by UV lithography and electroplating
    • Oiso, Japan, 25-28 January
    • C. Beuret, G.-A. Racine, J. Gobet, R. Luthier, N.F. de Rooij, Microfabrication of 3D multidirectional inclined structures by UV lithography and electroplating, MEMS '94, Oiso, Japan, 25-28 January 1993, pp. 81-85.
    • (1993) MEMS '94 , pp. 81-85
    • Beuret, C.1    Racine, G.-A.2    Gobet, J.3    Luthier, R.4    De Rooij, N.F.5
  • 4
    • 0042285052 scopus 로고
    • Development of a fine pitch bumping process
    • Berlin, Germany, 10-13 September
    • G. Engelmann, O. Ehrmann, J. Simon, H. Reichl, Development of a fine pitch bumping process, Micro System Technologies 90, Berlin, Germany, 10-13 September 1990, pp. 435-440.
    • (1990) Micro System Technologies , vol.90 , pp. 435-440
    • Engelmann, G.1    Ehrmann, O.2    Simon, J.3    Reichl, H.4
  • 7
    • 0002214777 scopus 로고    scopus 로고
    • EPON SU-8: A low-cost negative resist for MEMS
    • Barcelona, Spain, 21-22 October
    • H. Lorenz, M. Despont, N. Fahrni, N. LaBianca, P. Renaud, P. Vettiger, EPON SU-8: A low-cost negative resist for MEMS, MME '96, Barcelona, Spain, 21-22 October 1996, pp. 32-35.
    • (1996) MME '96 , pp. 32-35
    • Lorenz, H.1    Despont, M.2    Fahrni, N.3    LaBianca, N.4    Renaud, P.5    Vettiger, P.6
  • 8
    • 0030677606 scopus 로고    scopus 로고
    • High aspect ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications
    • Nagoya, Japan, 26-30 January
    • M. Despont, H. Lorenz, N. Fahrni, J. Brugger, P. Renaud, P. Vettiger, High aspect ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications, MEMS '97, Nagoya, Japan, 26-30 January 1997, pp. 518-522.
    • (1997) MEMS '97 , pp. 518-522
    • Despont, M.1    Lorenz, H.2    Fahrni, N.3    Brugger, J.4    Renaud, P.5    Vettiger, P.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.