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Volumn 546, Issue , 2013, Pages 104-107
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Microstructural analysis of InGaN/GaN epitaxial layers of metal organic chemical vapor deposition on c-plane of convex patterned sapphire substrate
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Author keywords
Gallium nitride; Indium gallium nitride; Metal organic chemical vapor deposition; Microstructure; Multi quantum wells; Transmission electron microscopy
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Indexed keywords
CHEMICAL ANALYSIS;
DEPOSITION;
EDGE DISLOCATIONS;
GALLIUM NITRIDE;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
INDUSTRIAL CHEMICALS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MICROSTRUCTURE;
NITRIDES;
ORGANIC CHEMICALS;
ORGANOMETALLICS;
SAPPHIRE;
SURFACE DEFECTS;
TELECOMMUNICATION REPEATERS;
TEMPERATURE;
TRANSMISSION ELECTRON MICROSCOPY;
VAPOR DEPOSITION;
DENSITY OF DISLOCATION;
DISLOCATION DENSITIES;
INDIUM GALLIUM NITRIDE;
METAL ORGANIC;
MICROSTRUCTURAL ANALYSIS;
MULTI QUANTUM WELLS;
PATTERNED SAPPHIRE SUBSTRATE;
THREADING DISLOCATION;
SEMICONDUCTOR QUANTUM WELLS;
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EID: 84885329662
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2013.05.111 Document Type: Conference Paper |
Times cited : (4)
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References (17)
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