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Volumn 31, Issue 5, 2013, Pages

Flexible substrate and release layer for flexible MEMS devices

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER WAFERS; COMMON SOLVENTS; FABRICATION EQUIPMENT; FLEXIBLE SUBSTRATE; HIGH-GLASS TRANSITION TEMPERATURES; MEMS FABRICATION TECHNIQUES; SILICON CARRIERS; WAFER CLEANING;

EID: 84884946124     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4816938     Document Type: Article
Times cited : (18)

References (27)
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  • 11
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    • 10.1016/S0032-3861(99)00546-7
    • M. Kotera, T. Nishino, and K. Nakamae, Polymer 41, 3615 (2000). 10.1016/S0032-3861(99)00546-7
    • (2000) Polymer , vol.41 , pp. 3615
    • Kotera, M.1    Nishino, T.2    Nakamae, K.3
  • 13
    • 34547816749 scopus 로고    scopus 로고
    • 10.1002/adma.200602223
    • Y. Sun and J. A. Rogers, Adv. Mater. 19, 1897 (2007). 10.1002/adma.200602223
    • (2007) Adv. Mater. , vol.19 , pp. 1897
    • Sun, Y.1    Rogers, J.A.2
  • 22
    • 84884953945 scopus 로고    scopus 로고
    • Estane Thermoplastic Polyuthrane, general brochure, Lubrizol Advance Material, Inc.
    • Estane Thermoplastic Polyuthrane, general brochure, Lubrizol Advance Material, Inc.
  • 27
    • 0030233248 scopus 로고    scopus 로고
    • 10.1016/0040-6090(95)08498-3
    • M. T. Kim, Thin Solid Films 283, 12 (1996). 10.1016/0040-6090(95)08498-3
    • (1996) Thin Solid Films , vol.283 , pp. 12
    • Kim, M.T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.