Copper-vapor-assisted chemical vapor deposition for high-quality and metal-free single-layer graphene on amorphous SiO2 substrate

ACS Nano

Volumn 7, Issue 8, 2013, Pages 6575-6582

  Kim, Hyungki ^a   Song, Intek ^a   Park, Chibeom ^a   Son, Minhyeok ^a   Hong, Misun ^a   Kim, Youngwook ^a   Kim, Jun Sung ^a   Shin, Hyun Joon ^a   Baik, Jaeyoon ^a   Choi, Hee Cheul ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

chemical vapor deposition; copper vapor; dielectric substrates; graphene

Indexed keywords

AMORPHOUS SUBSTRATE; CHEMICAL VAPOR DEPOSITIONS (CVD); COPPER VAPOR; DIELECTRIC SUBSTRATES; HEXAGONAL BORON NITRIDE; NUCLEATION AND GROWTH; PHYSICAL CONTACTS; SYNCHROTRON X-RAY PHOTOELECTRON SPECTROSCOPIES;

AMORPHOUS SILICON; CATALYSTS; COPPER; FIELD EFFECT TRANSISTORS; GRAPHENE; METAL CLADDING; METHANE; PHOTOELECTRONS; QUARTZ; SILICON; SUBSTRATES; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 84883235149     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn402847w     Document Type: Article

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