-
1
-
-
0036575326
-
Effects of floating-gate interference on NAND flash memory cell operation
-
May
-
J. D. Lee, S. H. Hur, and J. D. Choi, "Effects of floating-gate interference on NAND flash memory cell operation," IEEE Electron Device Lett., vol. 23, no. 5, pp. 264-266, May 2002.
-
(2002)
IEEE Electron Device Lett.
, vol.23
, Issue.5
, pp. 264-266
-
-
Lee, J.D.1
Hur, S.H.2
Choi, J.D.3
-
2
-
-
79951821135
-
Investigation of ballistic current in scaled floating-gate NAND flash and a solution
-
Dec.
-
S. Raghunathan, T. Krishnamohan, K. Parat, et al, "Investigation of ballistic current in scaled floating-gate NAND flash and a solution," in Proc. IEEE IEDM, Dec. 2009, pp. 819-822.
-
(2009)
Proc. IEEE IEDM
, pp. 819-822
-
-
Raghunathan, S.1
Krishnamohan, T.2
Parat, K.3
-
3
-
-
79958069165
-
Ultimate scalability of TaN metal floating gate with incorporation of high-K blocking dielectrics for flash memory applications
-
Dec.
-
S. Jayanti, X. Yang, R. Suri, et al, "Ultimate scalability of TaN metal floating gate with incorporation of high-K blocking dielectrics for flash memory applications," in Proc. IEEE IEDM, Dec. 2010, pp. 106-109.
-
(2010)
Proc. IEEE IEDM
, pp. 106-109
-
-
Jayanti, S.1
Yang, X.2
Suri, R.3
-
4
-
-
84857445725
-
Hybrid floating gate cell for sub-20-nm NAND flash memory technology
-
Mar.
-
P. Blomme, A. Cacciato, D. Wellekens, et al, "Hybrid floating gate cell for sub-20-nm NAND flash memory technology," IEEE Electron Device Lett., vol. 33, no. 3, pp. 333-335, Mar. 2012.
-
(2012)
IEEE Electron Device Lett.
, vol.33
, Issue.3
, pp. 333-335
-
-
Blomme, P.1
Cacciato, A.2
Wellekens, D.3
-
5
-
-
79960015313
-
Investigation of thermal stability of high-κ interpoly dielectrics in TaN metal floating gate memory structures
-
May
-
S. Jayanti, X. Yang, and V. Misra, "Investigation of thermal stability of high-κ interpoly dielectrics in TaN metal floating gate memory structures," in Proc. 3rd IEEE IMW, May 2011, pp. 1-4.
-
(2011)
Proc. 3rd IEEE IMW
, pp. 1-4
-
-
Jayanti, S.1
Yang, X.2
Misra, V.3
-
6
-
-
84867304039
-
A roadmap for graphene,"
-
Oct.
-
K. S. Novoselov, V. I. Falko, L. Colombo, et al, "A roadmap for graphene," Nature, vol. 490, pp. 192-200, Oct. 2012.
-
(2012)
Nature
, vol.490
, pp. 192-200
-
-
Novoselov, K.S.1
Falko, V.I.2
Colombo, L.3
-
7
-
-
80055020282
-
Graphene flash memory
-
A. J. Hong, E. B. Song, H. S. Yu, et al, "Graphene flash memory," ACS Nano, vol. 5, no. 10, pp. 7812-7817, 2011.
-
(2011)
ACS Nano
, vol.5
, Issue.10
, pp. 7812-7817
-
-
Hong, A.J.1
Song, E.B.2
Yu, H.S.3
-
8
-
-
77951190481
-
Wide memory window in graphene oxide charge storage nodes
-
S. Wang, J. Pu, D. S. H. Chan, et al, "Wide memory window in graphene oxide charge storage nodes," Appl. Phys. Lett., vol. 96, no. 14, pp. 143109-1-143109-3, 2010.
-
(2010)
Appl. Phys. Lett.
, vol.96
, Issue.14
, pp. 1431091-1431093
-
-
Wang, S.1
Pu, J.2
Chan, D.S.H.3
-
9
-
-
84864119961
-
Multilayer graphene as charge storage layer in floating gate flash memory
-
May
-
A. Mishra, H. Kalita, M. Waikar, et al., "Multilayer graphene as charge storage layer in floating gate flash memory," in Proc. IEEE IMW, May 2012, pp. 1-4.
-
(2012)
Proc. IEEE IMW
, pp. 1-4
-
-
Mishra, A.1
Kalita, H.2
Waikar, M.3
-
10
-
-
77954034857
-
Impact of SiN composition variation on SANOS memory performance and reliability under NAND (FN/FN) operation
-
Dec.
-
C. Sandhya, A. B. Oak, N. Chattar, et al, "Impact of SiN composition variation on SANOS memory performance and reliability under NAND (FN/FN) operation," IEEE Trans. Electron Devices, vol. 56, no. 12, pp. 3123-3132, Dec. 2009.
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, Issue.12
, pp. 3123-3132
-
-
Sandhya, C.1
Oak, A.B.2
Chattar, N.3
-
11
-
-
84862137638
-
Work function tuning and improved gate dielectric reliability with multilayer graphene as a gate electrode for metal oxide semiconductor field effect device applications
-
A. Misra, M. Waikar, A. Gour, et al, "Work function tuning and improved gate dielectric reliability with multilayer graphene as a gate electrode for metal oxide semiconductor field effect device applications," Appl. Phys. Lett., vol. 100, no. 23, pp. 233506-1-233506-5, 2012.
-
(2012)
Appl. Phys. Lett.
, vol.100
, Issue.23
, pp. 2335061-2335065
-
-
Misra, A.1
Waikar, M.2
Gour, A.3
-
12
-
-
0004038844
-
-
Boston MA USA: Kluwer
-
P. Cappelletti, C. Golla, R. Olivio, et al, Flash Memories. Boston, MA, USA: Kluwer, 1999.
-
(1999)
Flash Memories
-
-
Cappelletti, P.1
Golla, C.2
Olivio, R.3
-
13
-
-
84883200421
-
Nonvolatile memory cell based on MoS2/graphene heterostructures
-
S. Bertolazzi, D. Krasnozhon, and A. Kis, "Nonvolatile memory cell based on MoS2/graphene heterostructures," ACS Nano, vol. 5, no. 10, pp. 7812-7817, 2013.
-
(2013)
ACS Nano
, vol.5
, Issue.10
, pp. 7812-7817
-
-
Bertolazzi, S.1
Krasnozhon, D.2
Kis, A.3
-
14
-
-
33745299453
-
Low-energy electronic properties of the AB-stacked few-layer graphites
-
DOI 10.1088/0953-8984/18/26/005, PII S0953898406194230, 005
-
C. L. Lu, C. P. Chang, Y. C. Huang, et al, "Low-energy electronic properties of the AB-stacked few-layer graphites," J. Phys., Condens. Matter, vol. 18, no. 26, pp. 5849-5859, 2006. (Pubitemid 43932840)
-
(2006)
Journal of Physics Condensed Matter
, vol.18
, Issue.26
, pp. 5849-5859
-
-
Lu, C.L.1
Chang, C.P.2
Huang, Y.C.3
Lu, J.M.4
Hwang, C.C.5
Lin, M.F.6
-
15
-
-
33751035727
-
4/HfSiON stack for improved retention
-
DOI 10.1109/.2006.1629489, 1629489, 21st IEEE Non-Volatile Semiconductor Memory Workshop 2006, NVSMW 2006
-
R. van Schaijk, M. van Duuren, N. Akil, et al, "A novel SONOS memory with HfSiON/Si3N4/HfSiON stack for improved retention," in Proc. NVSMWICMTD, 2006, pp. 50-51. (Pubitemid 44753349)
-
(2006)
21st IEEE Non-Volatile Semiconductor Memory Workshop 2006, NVSMW 2006
, vol.2006
, pp. 50-51
-
-
Van Schaijk, R.1
Van Duuren, M.2
Akil, N.3
Huerta, A.4
Beckx, S.5
Neuilly, F.6
Rittersma, Z.7
Slotboom, M.8
Van Elshocht, S.9
Wouters, J.10
-
16
-
-
84874635725
-
a) of failure mechanisms in advanced NAND flash cells for different generations and cycling
-
Mar.
-
a) of failure mechanisms in advanced NAND flash cells for different generations and cycling," IEEE Trans. Electron Devices, vol. 60, no. 3, pp. 1099-1107, Mar. 2013.
-
(2013)
IEEE Trans. Electron Devices
, vol.60
, Issue.3
, pp. 1099-1107
-
-
Lee, K.1
Kang, M.2
Seo, S.3
|