A novel SONOS memory with HfSiON/Si3N4/HfSiON stack for improved retention

21st IEEE Non-Volatile Semiconductor Memory Workshop 2006, NVSMW 2006

Volumn 2006, Issue , 2006, Pages 50-51

  Van Schaijk, R ^a   Van Duuren, M ^a   Akil, N ^a   Huerta, A ^a   Beckx, S ^b   Neuilly, F ^a   Rittersma, Z ^a   Slotboom, M ^a   Van Elshocht, S ^b   Wouters, J ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DATA REDUCTION; DIELECTRIC MATERIALS; HAFNIUM COMPOUNDS; SANDWICH STRUCTURES; SILICA;

DATA RETENTION; MEMORY ARRAYS; NITRIDED HAFNIUM SILICATE (HFSION); SONOS;

DATA STORAGE EQUIPMENT;

EID: 33751035727     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2006.1629489     Document Type: Conference Paper

References (5)

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3. G. Shang et al., Appl. Phys. Lett., Vol. 84, No. 1, pp. 106, 2004
4. R. van Schaijk et al., proc. ICTMD, pp. 219-221, 2005
5. R. van Schaijk et al., proc ESSDERC, pp. 277-280, 2004