-
1
-
-
79960642086
-
-
10.1038/nmat3070
-
M.-J. Lee, C. B. Lee, D. Lee, S. R. Lee, M. Chang, J. H. Hur, Y.-B. Kim, C.-J. Kim, D. H. Seo, S. Seo, U.-I. Chung, I.-K. Yoo, and K. Kim, Nature Mater. 10, 625 (2011). 10.1038/nmat3070
-
(2011)
Nature Mater.
, vol.10
, pp. 625
-
-
Lee, M.-J.1
Lee, C.B.2
Lee, D.3
Lee, S.R.4
Chang, M.5
Hur, J.H.6
Kim, Y.-B.7
Kim, C.-J.8
Seo, D.H.9
Seo, S.10
Chung, U.-I.11
Yoo, I.-K.12
Kim, K.13
-
2
-
-
36049053305
-
-
10.1103/PhysRevLett.21.1450
-
S. R. Ovshinsky, Phys. Rev. Lett. 21, 1450 (1968). 10.1103/PhysRevLett. 21.1450
-
(1968)
Phys. Rev. Lett.
, vol.21
, pp. 1450
-
-
Ovshinsky, S.R.1
-
3
-
-
33745038459
-
-
10.1063/1.2211147
-
A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett. 88, 232112 (2006). 10.1063/1.2211147
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 232112
-
-
Sawa, A.1
Fujii, T.2
Kawasaki, M.3
Tokura, Y.4
-
4
-
-
77949490078
-
-
(Oxford, England) [41, 301 (2010)].
-
P. Gao, Z. Wang, W. Fu, Z. Liao, K. Liu, W. Wang, X. Bai, and E. Wang, Micron (Oxford, England, 1993) [41, 301 (2010)].
-
(1993)
Micron
-
-
Gao, P.1
Wang, Z.2
Fu, W.3
Liao, Z.4
Liu, K.5
Wang, W.6
Bai, X.7
Wang, E.8
-
5
-
-
46749093701
-
-
10.1038/nnano.2008.160
-
J. J. Yang, M. D. Pickett, X. Li, D. A. A. Ohlberg, D. R. Stewart, and R. S. Williams, Nat. Nanotechnol. 3, 429 (2008). 10.1038/nnano.2008.160
-
(2008)
Nat. Nanotechnol.
, vol.3
, pp. 429
-
-
Yang, J.J.1
Pickett, M.D.2
Li, X.3
Ohlberg, D.A.A.4
Stewart, D.R.5
Williams, R.S.6
-
7
-
-
0021093645
-
-
10.1016/0040-6090(83)90175-X
-
C. B. Greenberg, Thin Solid Films 110, 73 (1983). 10.1016/0040-6090(83) 90175-X
-
(1983)
Thin Solid Films
, vol.110
, pp. 73
-
-
Greenberg, C.B.1
-
8
-
-
34547513244
-
-
10.1149/1.2750450
-
C.-Y. Lin, C.-Y. Wu, C.-Y. Wu, C. Hu, and T.-Y. Tseng, J. Electrochem. Soc. 154, G189 (2007). 10.1149/1.2750450
-
(2007)
J. Electrochem. Soc.
, vol.154
, pp. 189
-
-
Lin, C.-Y.1
Wu, C.-Y.2
Wu, C.-Y.3
Hu, C.4
Tseng, T.-Y.5
-
9
-
-
56649092816
-
-
10.1016/j.mee.2008.09.039
-
A. Lamperti, S. Spiga, H. L. Lu, C. Wiemer, M. Perego, E. Cianci, M. Alia, and M. Fanciulli, Microelectron. Eng. 85, 2425 (2008). 10.1016/j.mee.2008.09.039
-
(2008)
Microelectron. Eng.
, vol.85
, pp. 2425
-
-
Lamperti, A.1
Spiga, S.2
Lu, H.L.3
Wiemer, C.4
Perego, M.5
Cianci, E.6
Alia, M.7
Fanciulli, M.8
-
10
-
-
77952347658
-
-
10.1021/ja101742f
-
K. Oka, T. Yanagida, K. Nagashima, T. Kawai, J.-S. Kim, and B. H. Park, J. Am. Chem. Soc. 132, 6634 (2010). 10.1021/ja101742f
-
(2010)
J. Am. Chem. Soc.
, vol.132
, pp. 6634
-
-
Oka, K.1
Yanagida, T.2
Nagashima, K.3
Kawai, T.4
Kim, J.-S.5
Park, B.H.6
-
12
-
-
77958180651
-
-
10.1063/1.3489882
-
S. Lee, H. Kim, J. Park, and K. Yong, J. Appl. Phys. 108, 076101 (2010). 10.1063/1.3489882
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 076101
-
-
Lee, S.1
Kim, H.2
Park, J.3
Yong, K.4
-
13
-
-
84862138489
-
-
10.1063/1.4726084
-
R. Yang, K. Terabe, T. Tsuruoka, T. Hasegawa, and M. Aono, Appl. Phys. Lett. 100, 231603 (2012). 10.1063/1.4726084
-
(2012)
Appl. Phys. Lett.
, vol.100
, pp. 231603
-
-
Yang, R.1
Terabe, K.2
Tsuruoka, T.3
Hasegawa, T.4
Aono, M.5
-
15
-
-
33645641019
-
-
10.1038/nmat1614
-
K. Szot, W. Speier, G. Bihlmayer, and R. Waser, Nature Mater. 5, 312 (2006). 10.1038/nmat1614
-
(2006)
Nature Mater.
, vol.5
, pp. 312
-
-
Szot, K.1
Speier, W.2
Bihlmayer, G.3
Waser, R.4
-
16
-
-
34548656097
-
-
10.1002/adma.200602915
-
M. Janousch, G. I. Meijer, U. Staub, B. Delley, S. F. Karg, and B. P. Andreasson, Adv. Mater. 19, 2232 (2007). 10.1002/adma.200602915
-
(2007)
Adv. Mater.
, vol.19
, pp. 2232
-
-
Janousch, M.1
Meijer, G.I.2
Staub, U.3
Delley, B.4
Karg, S.F.5
Andreasson, B.P.6
-
17
-
-
78650663883
-
-
10.1063/1.3524216
-
X. T. Zhang, Q. X. Yu, Y. P. Yao, and X. G. Li, Appl. Phys. Lett. 97, 222117 (2010). 10.1063/1.3524216
-
(2010)
Appl. Phys. Lett.
, vol.97
, pp. 222117
-
-
Zhang, X.T.1
Yu, Q.X.2
Yao, Y.P.3
Li, X.G.4
-
18
-
-
35248862247
-
-
10.1002/pssr.200701003
-
K. Szot, R. Dittmann, W. Speier, and R. Waser, Phys. Status Solidi (RRL) 1, R86 (2007). 10.1002/pssr.200701003
-
(2007)
Phys. Status Solidi (RRL)
, vol.1
, pp. 86
-
-
Szot, K.1
Dittmann, R.2
Speier, W.3
Waser, R.4
-
19
-
-
78449303523
-
-
10.1002/adma.201001872
-
R. Muenstermann, T. Menke, R. Dittmann, and R. Waser, Adv. Mater. 22, 4819 (2010). 10.1002/adma.201001872
-
(2010)
Adv. Mater.
, vol.22
, pp. 4819
-
-
Muenstermann, R.1
Menke, T.2
Dittmann, R.3
Waser, R.4
-
20
-
-
79952910061
-
-
10.1088/0022-3727/44/12/125404
-
X. Sun, G. Li, X. Zhang, L. Ding, and W. Zhang, J. Phys. D: Appl. Phys. 44, 125404 (2011). 10.1088/0022-3727/44/12/125404
-
(2011)
J. Phys. D: Appl. Phys.
, vol.44
, pp. 125404
-
-
Sun, X.1
Li, G.2
Zhang, X.3
Ding, L.4
Zhang, W.5
-
21
-
-
79956215468
-
-
10.1088/0268-1242/26/7/075019
-
M. H. Tang, Z. P. Wang, J. C. Li, Z. Q. Zeng, X. L. Xu, G. Y. Wang, L. B. Zhang, Y. G. Xiao, S. B. Yang, B. Jiang, and J. He, Semicond. Sci. Technol. 26, 075019 (2011). 10.1088/0268-1242/26/7/075019
-
(2011)
Semicond. Sci. Technol.
, vol.26
, pp. 075019
-
-
Tang, M.H.1
Wang, Z.P.2
Li, J.C.3
Zeng, Z.Q.4
Xu, X.L.5
Wang, G.Y.6
Zhang, L.B.7
Xiao, Y.G.8
Yang, S.B.9
Jiang, B.10
He, J.11
-
23
-
-
80052931217
-
-
10.1063/1.3633271
-
W. Jiang, R. J. Kamaladasa, Y. M. Lu, A. Vicari, R. Berechman, P. A. Salvador, J. A. Bain, Y. N. Picard, and M. Skowronski, J. Appl. Phys. 110, 054514 (2011). 10.1063/1.3633271
-
(2011)
J. Appl. Phys.
, vol.110
, pp. 054514
-
-
Jiang, W.1
Kamaladasa, R.J.2
Lu, Y.M.3
Vicari, A.4
Berechman, R.5
Salvador, P.A.6
Bain, J.A.7
Picard, Y.N.8
Skowronski, M.9
-
26
-
-
76649125543
-
-
10.1002/adma.200901493
-
K. Shibuya, R. Dittmann, S. Mi, and R. Waser, Adv. Mater. 22, 411 (2010). 10.1002/adma.200901493
-
(2010)
Adv. Mater.
, vol.22
, pp. 411
-
-
Shibuya, K.1
Dittmann, R.2
Mi, S.3
Waser, R.4
-
27
-
-
84862909191
-
-
10.1186/1556-276X-6-599
-
X. Sun, G. Li, L. Chen, Z. Shi, and W. Zhang, Nanoscale Res. Lett. 6, 599 (2011). 10.1186/1556-276X-6-599
-
(2011)
Nanoscale Res. Lett.
, vol.6
, pp. 599
-
-
Sun, X.1
Li, G.2
Chen, L.3
Shi, Z.4
Zhang, W.5
-
28
-
-
58149523053
-
-
10.1063/1.3069140
-
B. P. Andreasson, M. Janousch, U. Staub, and G. I. Meijer, Appl. Phys. Lett. 94, 013513 (2009). 10.1063/1.3069140
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 013513
-
-
Andreasson, B.P.1
Janousch, M.2
Staub, U.3
Meijer, G.I.4
|