Impact of van der waals interactions on single asperity friction

Physical Review Letters

Volumn 111, Issue 3, 2013, Pages

  Lessel, Matthias ^a   Loskill, Peter ^a   Hausen, Florian ^b   Gosvami, Nitya Nand ^b   Bennewitz, Roland ^b   Jacobs, Karin ^a  

^a SAARLAND UNIVERSITY   (Germany)

^b INM LEIBNIZ INSTITUTE FOR NEW MATERIALS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LAYER THICKNESS; SI WAFER; SILANIZED; SINGLE ASPERITY FRICTION; SINGLE-ASPERITY MEASUREMENTS; SUB-SURFACE MATERIALS; VAN DER WAALS INTERACTION; VAN DER WAALS INTERACTIONS;

FRICTION; SILICON; SILICON WAFERS; TRIBOLOGY;

VAN DER WAALS FORCES;

EID: 84880516091     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.111.035502     Document Type: Article

References (36)

1. M. Nosonovsky and B. Bhushan, Mater. Sci. Eng. R 58, 162 (2007). MIGIEA 0927-796X 10.1016/j.mser.2007.09.001 (Pubitemid 350051886)
2. I. Szlufarska, C. Michael, and R. W. Carpick, J. Phys. D 41, 123001 (2008). JPAPBE 0022-3727 10.1088/0022-3727/41/12/123001
3. J. Krim, Adv. Phys. 61, 155 (2012). ADPHAH 0001-8732 10.1080/00018732. 2012.706401
4. A. Vanossi, N. Manini, M. Urbakh, S. Zapperi, and E. Tosatti, Rev. Mod. Phys. 85, 529 (2013). RMPHAT 0034-6861 10.1103/RevModPhys.85.529
5. F. W. Delrio, M. P. De Boer, J. A. Knapp, E. D. Reedy, Jr., P. J. Clews, and M. L. Dunn, Nat. Mater. 4, 629 (2005). NMAACR 1476-1122 10.1038/nmat1431 (Pubitemid 41092694)
6. F. M. Serry, D. Walliser, and G. J. Maclay, J. Appl. Phys. 84, 2501 (1998). JAPIAU 0021-8979 10.1063/1.368410
7. R. Seemann, S. Herminghaus, C. Neto, S. Schlagowski, D. Podzimek, R. Konrad, H. Manz, and K. Jacobs, J. Phys. Condens. Matter 17, S267 (2005). JCOMEL 0953-8984 10.1088/0953-8984/17/9/001 (Pubitemid 40407983)
8. R. Seemann, S. Herminghaus, and K. Jacobs, Phys. Rev. Lett. 86, 5534 (2001). PRLTAO 0031-9007 10.1103/PhysRevLett.86.5534 (Pubitemid 32548959)
9. P. Loskill, H. Hähl, N. Thewes, C. T. Kreis, M. Bischoff, M. Herrmann, and K. Jacobs, Langmuir 28, 7242 (2012). LANGD5 0743-7463 10.1021/la3004323
10. R. Podgornik and V. A. Parsegian, J. Chem. Phys. 120, 3401 (2004). JCPSA6 0021-9606 10.1063/1.1640338
11. J. Rafiee, X. Mi, H. Gullapalli, A. V. Thomas, F. Yavari, Y. Shi, P. M. Ajayan, and N. A. Koratkar, Nat. Mater. 11, 217 (2012). NMAACR 1476-1122 10.1038/nmat3228
12. P. Loskill, H. Hähl, T. Faidt, S. Grandthyll, F. Müller, and K. Jacobs, Adv. Colloid Interface Sci. 179-182, 107 (2012). ACISB9 0001-8686 10.1016/j.cis.2012.06.006
13. R. B. Walsh, A. Nelson, W. M. Skinner, D. Parsons, and V. S. J. Craig, J. Phys. Chem. C 116, 7838 (2012). JPCCCK 1932-7447 10.1021/jp300533m
14. P. Loskill, J. B. Puthoff, M. Wilkinson, K. Mecke, K. Jacobs, and K. Autumn, J. R. Soc. Interface 10, 20120587 (2012). 1742-5689 10.1098/rsif.2012. 0587
15. M. Lessel, O. Bäumchen, R. Fetzer, M. Klos, H. Hähl, R. Seemann, and K. Jacobs, http://arxiv.org/abs/1212.0998.
16. H. Hähl, F. Evers, S. Grandthyll, M. Paulus, C. Sternemann, P. Loskill, M. Lessel, A. K. Hüsecken, T. Brenner, M. Tolan, Langmuir 28, 7747 (2012). LANGD5 0743-7463 10.1021/la300850g
17. See Supplemental Material at http://link.aps.org/supplemental/10.1103/ PhysRevLett.111.035502 for a detailed roughness analysis of the Si wafers, a structural analysis of silane SAMs by X-ray reflectometry, and the calculation of the normalized shear strength.
18. B. W. Ewers and J. D. Batteas, J. Phys. Chem. C 116, 25 165 (2012). JPCCCK 1932-7447 10.1021/jp303097v
19. W. Maw, F. Stevens, S. C. Langford, and J. T. Dickinson, J. Appl. Phys. 92, 5103 (2002). JAPIAU 0021-8979 10.1063/1.1510595 (Pubitemid 35360695)
20. J. E. Sader, I. Larson, P. Mulvaney, and L. R. White, Rev. Sci. Instrum. 66, 3789 (1995). RSINAK 0034-6748 10.1063/1.1145439
21. C. P. Green, H. Lioe, J. P. Cleveland, R. Proksch, P. Mulvany, and J. E. Sader, Rev. Sci. Instrum. 75, 1988 (2004). RSINAK 0034-6748 10.1063/1.1753100
22. E. E. Flater, W. R. Ashurst, and R. W. Carpick, Langmuir 23, 9242 (2007). LANGD5 0743-7463 10.1021/la063644e (Pubitemid 47383510)
23. B. Bhushan and X. Li, J. Mater Res. 12, 54 (1997). 2044-5326 10.1557/JMR.1997.0010
24. M. T. Kim, Thin Solid Films 283, 12 (1996). THSFAP 0040-6090 10.1016/0040-6090(95)08498-3
25. I. Altfeder and J. Krim, J. Appl. Phys. 111, 094916 (2012). JAPIAU 0021-8979 10.1063/1.4717983
26. B. V. Derjaguin, V. M. Muller, and Y. P. Toporov, J. Colloid Interface Sci. 53, 314 (1975). JCISA5 0021-9797 10.1016/0021-9797(75)90018-1
27. D. Maugis, J. Colloid Interface Sci. 150, 243 (1992). JCISA5 0021-9797 10.1016/0021-9797(92)90285-T
28. R. W. Carpick, D. F. Ogletree, and M. Salmeron, J. Colloid Interface Sci. 211, 395 (1999). JCISA5 0021-9797 10.1006/jcis.1998.6027 (Pubitemid 29394640)
29. Retardation effects can be neglected on these small tip-surface separations. See J. N. Israelachvili, and D. Tabor, Nature (London) 236, 106 (1972). NATUAS 0028-0836 10.1038/physci236106a0
30. The identical results were obtained when using Eq. L1.25 from V. A. Parsegian, Van der Waals Forces: A Handbook for Biologists, Chemists, Engineers, and Physicists (Cambridge University Press, Cambridge, England, 2006), 1st ed.
31. V. A. Parsegian and B. W. Ninham, Nature (London) 224, 1197 (1969). NPSCA6 0300-8746
32. D. B. Hough and L. R. White, Adv. Colloid Interface Sci. 14, 3 (1980). ACISB9 0001-8686 10.1016/0001-8686(80)80006-6 (Pubitemid 11459016)
33. D. B. Asay and S. H. Kim, J. Chem. Phys. 124, 174712 (2006). JCPSA6 0021-9606 10.1063/1.2192510
34. T. Masuda, Y. Matsuki, and T. Shimoda, J. Colloid Interface Sci. 340, 298 (2009). JCISA5 0021-9797 10.1016/j.jcis.2009.08.028
35. V. A. Parsegian and G. H. Weiss, J. Colloid Interface Sci. 81, 285 (1981). JCISA5 0021-9797 10.1016/0021-9797(81)90325-8
36. T. J. Senden and C. J. Drummond, Colloids Surf. A 94, 29 (1995). CPEAEH 0927-7757 10.1016/0927-7757(94)02954-Q