Spectral parameters and Hamaker constants of silicon hydride compounds and organic solvents

Journal of Colloid and Interface Science

Volumn 340, Issue 2, 2009, Pages 298-305

  Masuda, Takashi ^a,b   Matsuki, Yasuo ^a,c   Shimoda, Tatsuya ^a,d  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b SEIKO EPSON CORPORATION   (Japan)

^c JSR CORPORATION   (Japan)

^d JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

CPS; Cyclic silane; Cyclopentasilane; Hamaker; Lifshitz; Liquid silicon; Polysilane; van der Waals

Indexed keywords

CPS; CYCLIC SILANE; CYCLOPENTASILANE; HAMAKER; LIFSHITZ; LIQUID SILICON; VAN DER WAALS;

HYDROGEN; LIQUIDS; ORGANIC SOLVENTS; POLYSILANES; SEMICONDUCTOR QUANTUM DOTS; SILANES; SPECTROSCOPY; VAN DER WAALS FORCES;

ABSORPTION;

ORGANIC SOLVENT; SILANE DERIVATIVE; SILICON;

ANALYTIC METHOD; ANALYTICAL PARAMETERS; ARTICLE; CHEMICAL STRUCTURE; ELECTRON; LIQUID; OSCILLATOR; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; RADIATION ABSORPTION; SPECTROSCOPY; ULTRAVIOLET RADIATION;

EID: 70349825966     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2009.08.028     Document Type: Article

References (27)

1. Shimoda T., et al. SID'99 Digest (1999) 372
2. Sirringhaus H., Kawase T., Friend R.H., Shimoda T., Inbasekaran M., Wu W., and Woo E.P. Science 290 (2000) 2123
3. Shimoda T., Matsuki Y., Furusawa M., Aoki T., Yudasaka I., Tanaka H., Iwasawa H., Wang D., Miyasaka M., and Takeuchi Y. Nature 440 (2006) 783
4. Hengge E., and Bauer G. Monatsh. Chem. 106 (1975) 503
5. E. Hengge, in:5th International Symposium on Organosilicon Chemistry Karlsruhe August, 1978, p. 261.
6. Tanaka H., Iwasawa H., Wang D., Toyoda N., Aoki T., Yudasaka I., Matsuki Y., Shimoda T., and Furusawa F. Jpn. J. Appl. Phys. 46 36 (2007) 886
7. 2 Films Using Hydrogenated Polysilane Based Liquid Materials, SID 2007, Long Beach Convention Center, Long Beach, CA, USA, May 20-25, 2007.
8. Tabor D., and Winterton R.H.S. Proc. R. Soc. A. 312 (1969) 435
9. Mahanty J., and Ninham B.W. Dispersion Forces (1976), Academic Press, New York
10. Hough D.B., and White L.R. Adv. Colloid Interface Sci. 14 (1980) 3
11. V.A. Parsegian, in: H. van Olphen, K.J. Mysels (Eds.), Physical Chemistry: Enriching Topics in Colloid and Surface Science, Theorex, La. Jolla, CA, 1975, pp. 27-72.
12. Handbook of Chemistry and Physics, 88th ed., CRC Press, Boca Raton, FL.
13. The Aldrich Library of FT-IR Spectra, Sigma-Aldrich Co., 1985.
14. Lifshitz E.M. Sov. Phys. Jetp. 2 (1956) 73
15. Ninham B.W., Parsegian V.A., and Weiss G.H. J. Stat. Phys. 2 (1970) 323
16. Landau L.D., and Lifshitz E.M. Electrodynamics of Continuous Media (1960), Pergamon
17. Parsegian V.A., and Ninham B.W. Nature 224 (1969) 1197
18. V.A. Parsegian, in: H. van Olphen and K. J. Mysels (Eds.), Physical Chemistry: Enriching Topics in Colloid and Surface Science, Theorex, La. Jolla, CA, 1975, pp. 27-72.
19. Bergstrom L. Adv. Colloid Interface Sci. 70 (1997) 125
20. Prieve D.C., and Russel W.B. J. Colloid Interface Sci. 125 (1988) 1
21. T. Kogai, H. Yatsuda, Y. Shiokawa, SH-SAW Dip Method Solution Sensor, the 36th EM Symposium, May 2007, pp. 49-52.
22. Kipping F.F., and Sands J.E. J. Chem. Soc. London 119 (1921) 830
23. Caminati W., and Grabow J.U. J. Am. Chem. Soc. 128 (2006) 854
24. Israelachvili J.N. Intermolecular and Surface Forces (1985), Academic Press, New York
25. Sakurai Y., Yoshimura D., Ishii H., Ouchi Y., Isaka H., Teramae H., Matumoto N., Hasegawa S., Ueno N., and Seki K. J. Phys. Chem. B 105 24 (2001) 5626
26. Oss C.J.V., Chaudhury M.K., and Good R.J. Chem. Rev. 88 (1988) 927
27. Meurk A., Luckham P.F., and Bergstrom L. Langmuir 13 (1997) 3896