Is adhesion superficial? Silicon wafers as a model system to study van der Waals interactions

Advances in Colloid and Interface Science

Volumn 179-182, Issue , 2012, Pages 107-113

  Loskill, Peter ^a   Hähl, Hendrik ^a   Faidt, Thomas ^a   Grandthyll, Samuel ^a   Müller, Frank ^a   Jacobs, Karin ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

Adhesion; Multilayer; Silicon oxide layer; van der Waals interactions

Indexed keywords

ADHESIVE FORCE; BULK MATERIALS; MODEL SUBSTRATES; MODEL SYSTEM; NATIVE OXIDE LAYER; SILICON OXIDE LAYERS; SUB-SURFACE MATERIALS; SURFACE PARAMETER; THEORETICAL STUDY; VAN DER WAALS-INTERACTIONS;

ADHESION; COATED MATERIALS; MULTILAYERS; SILICON OXIDES; VAN DER WAALS FORCES;

SILICON WAFERS;

EID: 84865027786     PISSN: 00018686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cis.2012.06.006     Document Type: Review

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