Substrate heating and post-annealing effect on tungsten/tungsten carbide bilayers grown by non-reactive DC magnetron sputtering

Ceramics International

Volumn 39, Issue 7, 2013, Pages 7355-7365

  Agudelo Morimitsu, L C ^a   De La Roche, J ^a   Escobar, D ^a   Ospina, R ^a   Restrepo Parra, E ^a  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

Author keywords

AES; AFM; Raman; SEM; XRD

Indexed keywords

AES; AFM; CRYSTALLOGRAPHIC TEXTURES; DC MAGNETRON SPUTTERING; DEPTH-PROFILE ANALYSIS; ENERGY DISPERSIVE SPECTROSCOPIES (EDS); RAMAN; XRD;

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; COATINGS; ENERGY DISPERSIVE SPECTROSCOPY; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TUNGSTEN; X RAY DIFFRACTION;

TUNGSTEN CARBIDE;

EID: 84880299381     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2013.02.075     Document Type: Article

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