Influence of the annealing temperature on a crystal phase of W/WC bilayers grown by pulsed arc discharge

Vacuum

Volumn 81, Issue 3, 2006, Pages 373-377

  Ospina, R ^a   Castillo, H A ^a   Benavides, V ^a   Restrepo, E ^a   Arango, Y C ^a   Arias, D F ^a   Devia, A ^a  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

Author keywords

Bilayer; Hard coat; Pulsed arc plasma; W WC

Indexed keywords

ANNEALING; ARGON; CRYSTALLOGRAPHY; DISCHARGE LAMPS; METHANE; PLASMA WELDING; TUNGSTEN CARBIDE; X RAY DIFFRACTION;

CRYSTAL PHASES; DISCHARGE VOLTAGE; HARD COAT; PULSED ARC PLASMA;

MULTILAYERS;

EID: 33749135990     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.06.004     Document Type: Article

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