Effect of substrate temperature variation on nanostructured WC films prepared using HFCVD technique

Materials Letters

Volumn 62, Issue 10-11, 2008, Pages 1547-1550

  Yang, B Q ^a   Wang, X P ^a   Zhang, H X ^a   Wang, Z B ^b   Feng, P X ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

CVD; Nanocrystalline structure; Thin film; Tungsten carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ENERGY DISPERSIVE SPECTROSCOPY; THIN FILMS; TUNGSTEN CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLINE STRUCTURES; NANOCRYSTALLINE STRUCTURES; SUBSTRATE TEMPERATURE VARIATION;

NANOSTRUCTURED MATERIALS;

EID: 38849117707     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2007.09.020     Document Type: Article

References (21)

1. Srivastava P.K., Vankar V.D., and Chopra K.L. J. Vac. Sci. Technol., A 4 (1986) 2819
2. Jhi S.H., Louie S.G., Cohen M.L., et al. Phys.Rev.Lett. 86 (2001) 3348
3. Nikolova V., Nikolov I., Andreev P., et al. J. Appl. Electrochem. 30 (2000) 705-710
4. Gouy-Pailler Ph., and Pauleau Y. J. Vac. Sci. Technol., A 11 (1993) 96
5. Srivastava P.K., Vankar V.D., and Chopra K.L. J. Vac. Sci. Technol., A 2 (1984) 1261
6. Rack P.D., Peterson J., Li J., et al. J. Vac. Sci. Technol., A 19 1 (2001) 62
7. Suda Y., Yukimura K., Nakamura K., et al. Jpn. j. appl. phys. 45 (2006) 8449-8452
8. Palmquist J.P., Czigany Zs., Hultman L., et al. J. cryst. growth 259 (2003) 12-17
9. Chitica N., Gyorgy E., Lita A., et al. Thin Solid Films 301 (1997) 71
10. Garg D., Dyer P.N., Dimos D.B., et al. J. Am. Ceram. Soc. 75 44 (1992) 1008-1011
11. Sun Y.-M., Lee S.Y., Lemonds A.M., et al. Thin Solid Films 397 (2001) 109-115
12. Kelly C.M., Grag D., and Dycr P.N. Thin Solid Films 219 (1992) 103
13. Romanus H., Cimalla V., Schaefer J.A., et al. Thin Solid Films 359 (2000) 146
14. Voevodin A.A., O' neill J.P., Prasad S.V., et al. J. Vac. Sci. Technol., A 17 (1999) 986
15. Monteiro O.R., Delplancke-Ogletree M.P., Winand R., et al. Surf. Coat. Technol. 94-95 (1997) 220
16. Voevodin A.A., O'Neill J.P., Prasad S.V., et al. J. Vac. Sci. Technol., A 17 3 (1999) 986
17. Rack D., Peterson J.J., Li J., et al. J. Vac. Sci. Technol., A 19 1 (2001) 62
18. Nonaka K., Takase A., and Miyakawa K. J. Mater. Sci. Lett. 12 (1993) 274
19. Lu Z., Kanan S.M., and Tripp C.P. J. Mater. Chem. 12 (2002) 983
20. Radic N., Pivac B., Meinardi F., et al. Mater. Sci. Eng., A 396 (2005) 290-295
21. Feng P.X., Yang P., and Shi Y.C. J. Cryst. Growth 29 (2006) 22