Position averaged convergent beam electron diffraction: Theory and applications

Ultramicroscopy

Volumn 110, Issue 2, 2010, Pages 118-125

  LeBeau, James M ^a   Findlay, Scott D ^b   Allen, Leslie J ^c   Stemmer, Susanne ^a  

^a University of California   (United States)

^b UNIVERSITY OF TOKYO   (Japan)

^c UNIVERSITY OF MELBOURNE   (Australia)

Author keywords

CBED; Polarity; STEM; Thickness measurement

Indexed keywords

ATOMIC RESOLUTION; CBED; CONVERGENT-BEAM ELECTRON DIFFRACTION; DIFFUSE SCATTERING; ELECTRON PROBE; HIGHLY SENSITIVE; LENS ABERRATION; MODEL CALCULATIONS; OPTICAL CONDITION; PATTERN-MATCHING ALGORITHM; PROBE POSITION; SOURCE SIZES; SPECIMEN THICKNESS; THICK SAMPLES; UNIT CELLS; VISUAL COMPARISON;

DIFFRACTION GRATINGS; DIFFRACTION PATTERNS; ELECTRON DIFFRACTION; HOLOGRAPHIC INTERFEROMETRY; LIGHT TRANSMISSION; PROBES; SCANNING ELECTRON MICROSCOPY; SIMULATORS; THICKNESS GAGES; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRONS;

ARTICLE; ELECTRON BEAM; ELECTRON DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON PROBE MICROANALYSIS; PATTERN RECOGNITION; PHONON; POLARIZATION; POSITION EFFECT; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS; SIMULATION; THICKNESS;

EID: 72649104022     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2009.10.001     Document Type: Article

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