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1
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84861125089
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Metal-oxide RRAM
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Jun.
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H.-S. P. Wong, H.-Y. Lee, S. Yu, Y.-S. Chen, Y. Wu, P.-S. Chen, B. Lee, F. T. Chen, and M.-J. Tsai, "Metal-oxide RRAM," Proc. IEEE, vol. 100, no. 6, pp. 1951-1970, Jun. 2012.
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Wong, H.-S.P.1
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Lee, B.7
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2
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80855156709
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Sub-nanosecond switching of a tantalum oxide memristor
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Dec.
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A. C. Torrezan, J. P. Strachan, G. Medeiros-Ribeiro, and R. S. Williams, "Sub-nanosecond switching of a tantalum oxide memristor," Nanotechnology, vol. 22, no. 48, pp. 485203-1-485203-, Dec. 2011.
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3
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Control of filament size and reduction of reset current below 10 ?A in NiO resistance switching memories
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Apr.
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F. Nardi, D. Ielmini, C. Cagli, S. Spiga, M. Fanciulli, L. Goux, and D. J. Wouters, "Control of filament size and reduction of reset current below 10 ?A in NiO resistance switching memories," Solid State Electron., vol. 58, no. 1, pp. 42-47, Apr. 2011.
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Nardi, F.1
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Goux, L.6
Wouters, D.J.7
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On the switching parameter variation of metal-oxide RRAM-Part I: Physical modeling and simulation methodology
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Apr.
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X. Guan, S. Yu, and H.-S. P. Wong, "On the switching parameter variation of metal-oxide RRAM-Part I: Physical modeling and simulation methodology," IEEE Trans. Electron Devices, vol. 59, no. 4, pp. 1172-1182, Apr. 2012.
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Guan, X.1
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5
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Intrinsic switching behavior in HfO2 RRAM by fast electrical measurements on novel 2R test structures
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May
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A. Fantini, D. J. Wouters, R. Degraeve, L. Goux, L. Pantisano, G. Kar, Y.-Y. Chen, B. Govoreanu, J. A. Kittl, L. Altimime, and M. Jurczak, "Intrinsic switching behavior in HfO2 RRAM by fast electrical measurements on novel 2R test structures," in Proc. IEEE-Int. Memory Workshop, May 2012, pp. 1-4.
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Fantini, A.1
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Chen, Y.-Y.7
Govoreanu, B.8
Kittl, J.A.9
Altimime, L.10
Jurczak, M.11
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6
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64549149261
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Low power and high speed bipolar switching with a thin reactive Ti buffer layer in robust HfO2 based RRAM
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Dec.
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H. Y. Lee, P. S. Chen, T. Y. Wu, Y. S. Chen, C. C. Wang, P. J. Tzeng, C. H. Lin, F. Chen, C. H. Lien, and M.-J. Tsai, "Low power and high speed bipolar switching with a thin reactive Ti buffer layer in robust HfO2 based RRAM," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2008, pp. 1-4.
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(2008)
Proc. IEEE Int. Electron Devices Meeting
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Lee, H.Y.1
Chen, P.S.2
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Chen, Y.S.4
Wang, C.C.5
Tzeng, P.J.6
Lin, C.H.7
Chen, F.8
Lien, C.H.9
Tsai, M.-J.10
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7
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84876128921
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Realtime study of switching kinetics in integrated 1T/ HfOx 1R RRAM: Intrinsic tunability of set/reset voltage and trade-off with switching time
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Dec.
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S. Koveshnikov, K. Matthews, S. Deora, D. C. Gilmer, M. G. Sung, G. Bersuker, H.F. Li, S. Gausepoh, P. D. Kirsch, and R. Jammy, "Realtime study of switching kinetics in integrated 1T/ HfOx 1R RRAM: Intrinsic tunability of set/reset voltage and trade-off with switching time," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2012, pp. 1-3.
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Koveshnikov, S.1
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Li, H.F.7
Gausepoh, S.8
Kirsch, P.D.9
Jammy, R.10
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8
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Modeling the universal set/reset characteristics of bipolar RRAM by field-and temperature-driven filament growth
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Dec.
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D. Ielmini, "Modeling the universal set/reset characteristics of bipolar RRAM by field-and temperature-driven filament growth," IEEE Trans. Electron Devices, vol. 58, no. 12, pp. 4309-4317, Dec. 2011.
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Ielmini, D.1
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9
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Resistance-dependent amplitude of random telegraph signal noise in resistive switching memories
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Feb.
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D. Ielmini, F. Nardi, and C. Cagli, "Resistance-dependent amplitude of random telegraph signal noise in resistive switching memories," Appl. Phys. Lett., vol. 96, no. 5, pp. 053503-053506, Feb. 2010.
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Ielmini, D.1
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On the weibull shape factor of intrinsic breakdown of dielectric films and its accurate experimental determination. Part I: Theory, methodology, experimental techniques
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Dec.
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E. Y. Wu and R.-P. Vollertsen, "On the weibull shape factor of intrinsic breakdown of dielectric films and its accurate experimental determination. Part I: Theory, methodology, experimental techniques," IEEE Trans. Electron Devices, vol. 49, no. 12, pp. 2131-2140, Dec. 2002.
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Wu, E.Y.1
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Complementary switching in oxide-based bipolar resistive switching memory (RRAM)
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Jan.
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F. Nardi, S. Balatti, S. Larentis, D. C. Gilmer, and D. Ielmini, "Complementary switching in oxide-based bipolar resistive switching memory (RRAM)," IEEE Trans. Electron Devices, vol. 60, no. 1, pp. 70-77, Jan. 2013.
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84864485488
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Analysis of complementary RRAM switching
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Aug.
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D. J. Wouters, L. Zhang, A. Fantini, R. Degraeve, L. Goux, Y. Y. Chen, B. Govoreanu, G. S. Kar, G. V. Groeseneken, and M. Jurczak, "Analysis of complementary RRAM switching," IEEE Electron Device Lett., vol. 33, no. 8, pp. 1186-1188, Aug. 2012.
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Kar, G.S.8
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13
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77952328469
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Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity
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Dec.
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Y. S. Chen, H. Y. Lee, P. S. Chen, P. Y. Gu, C. W. Chen, W. P. Lin, W. H. Liu, Y. Y. Hsu, S. S. Sheu, P. C. Chiang, W. S. Chen, F. T. Chen, C. H. Lien, and M.-J. Tsai, "Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity," in Proc. IEEE Int. Electron Devices Meeting, Dec. 2009, pp. 1-4.
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Chen, Y.S.1
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Hsu, Y.Y.8
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